1.

Conference Proceedings
Conference Proceedings
1. Landing energy influence on CD-SEM measurement precision and accuracy [6152-187]
Fabre, A. L. ; Foucher, J. ; Poulingue, M. ; Fabre, P. ; Sundaram, G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61524J-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
2.

Conference Proceedings
Conference Proceedings
2. Electron beam metrology of 193-nm resists at ultralow voltage
Sullivan, N.T. ; Dixson, R. ; Bunday, B.D. ; Mastovich, M.E. ; Knutrud, P.C. ; Fabre, P. ; Brandom, R.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  1  pp.483-492,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
3.

Conference Proceedings
Conference Proceedings
3. Minimizing CD measurement bias through real-time acquisition of 3D feature shapes [6152-46]
Foucher, J. ; Gorelikov, D. ; Poulingue, M. ; Fabre, P. ; Sundaram, G.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61521A-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
4.

Conference Proceedings
Conference Proceedings
4. Overlay metrology results on leading-edge Cu processes
Vachellerie, V. ; Ristoiu, D. ; Deleporte, A.G. ; Sassoulas, P.-O. ; Spinelli, P. ; Poulingue, M. ; Fabre, P. ; Arendt, R. ; Sundaram, G. ; Knutrud, P.C.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVI.  Part One  pp.223-236,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4689