1.

Conference Proceedings
Conference Proceedings
1. Immersion specific defect mechanisms: findings and recommendations for their control [6154-180]
Kocsis, M. ; Van Den Heuvel, D. ; Gronheid, R. ; Maenhoudt, M. ; Vangoidsenhoven, D. ; Wells, G. ; Stepanenko, N. ; Benndorf, M. ; Kim, H. W ; Kishimura, S. ; Ercken, M. ; Van Roey, F. ; O’Brien, S. ; Fyen, W. ; Foubert, P ; Moerman, R ; Streefkerk, B.
Pub. info.: Optical Microlithography XIX.  pp.615409-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
2.

Conference Proceedings
Conference Proceedings
2. Dynamic leaching procedure on an immersion interference printer [6154-186]
Gronheid, R. ; Tenaglia, E. ; Ercken, M.
Pub. info.: Optical Microlithography XIX.  pp.61541I-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
3.

Conference Proceedings
Conference Proceedings
3. Early learning on hyper-NA lithography using two-beam immersion interference [6154-70]
Hendrickx, E. ; Op de Beeck, M. ; Gronheid, R. ; Versluijs, J. ; Van Look, L. ; Ercken, M. ; Vandenberghe, G.
Pub. info.: Optical Microlithography XIX.  pp.61541X-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
4.

Conference Proceedings
Conference Proceedings
4. Line-edge roughness reduction and CD slimming using hardback processing
Peters, R.D. ; Lucas, K. ; Cobb, J.L. ; Parker, C. ; Patterson, K. ; McCauley, R. ; Ercken, M. ; Roey, F.V. ; Vandenbroeck, N. ; Pollentier, I.K.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.1131-1142,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
5.

Conference Proceedings
Conference Proceedings
5. Comprehensive approach to MuGFET metrology [6152-45]
Lorusso. G. F ; Leray, P. ; Vandeweyer, T. ; Ercken, M. ; Delvaux, C. ; Pollentier, I. ; Cheng, S. ; Collaert, N. ; Rooyackers, R. ; Degroote, B.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.615219-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
6.

Conference Proceedings
Conference Proceedings
6. Tuning and simulating a 193-nm resist for 2D applications
Howard, W.B. ; Wiaux, V. ; Ercken, M. ; Bui, B. ; Byers, J.D. ; Pochkowski, M.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1190-1198,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Effects of different processing conditions on line-edge roughness for 193-nm and 157-nm resists
Ercken, M. ; Leunissen, L.H.A. ; Pollentier, I. ; Patsis, G.P. ; Constantoudis, V. ; Gogolides, E.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.266-275,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
8.

Conference Proceedings
Conference Proceedings
8. Optimization of scatterometry parameters for shallow trench isolation (STI) monitor
Leray, P.J. ; Cheng, S. ; Kremer, S. ; Ercken, M. ; Pollentier, I.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.576-586,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375