1.

Conference Proceedings
Conference Proceedings
1. SINGLE STEP LOW TEMPERATURE IN-SITU SUBSTRATE CLEANING FOR SILICON PROCESSING
Ramm, Juergen ; Beck, Eugen ; Steiner, Franz-Peter ; Pixley, Ralph E. ; Eisele, Ignaz
Pub. info.: Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A..  pp.249-254,  1992.  Pittsburgh, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 259
2.

Conference Proceedings
Conference Proceedings
2. Thermally Grown and Reoxidized Nitrides as Alternative Gate Dielectrics
Ludsteck, Alexandra ; Dietl, Waltraud ; Chung, Hinyiu ; Schulze, Joerg ; Nenyei, Zsolt ; Eisele, Ignaz
Pub. info.: Fundamentals of novel oxide/semiconductor interfaces : symposium held December 1-4, 2003, Boston, Massachusetts, U.S.A..  pp.245-250,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 786
3.

Conference Proceedings
Conference Proceedings
3. DRY HYDROGEN PLASMA CLEANING FOR LOCAL EPITAXIAL GROWTH
Ramm, Juergen ; Beck, Eugen ; Eisele, Ignaz ; Hansch, Walter ; Klepser, Bernd-Ulrich ; Senn, Hans
Pub. info.: Surface chemical cleaning and passivation for semiconductor processing.  pp.91-,  1993.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 315