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12 results

Conference Proceedings

1. Selection of parameters on laser cutting mild steel plates taking account of some manufacturing purposes

Asano, H. ; Suzuki, J. ; Kawakami, H. ; Eguchi, H.

Pub. info.:	Fourth International Symposium on Laser Precision Microfabrication : 21-24 June, 2003, Munich, Germany. pp.418-425, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5063

Conference Proceedings

2. Characterizing Thin-Film Stress Fields by Resonance of Membrane Arrays

Engelstad, R. ; Lovell, E. ; Chalekian, A. ; Janowski, S. ; Cash, M. ; Eguchi, H.

Pub. info.:	Thin films : stresses and mechanical properties X : symposium held December 1-5, 2003, Boston, Massachusetts, U.S.A.. pp.533-540, 2002. Warrendale, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	795

Technical Paper

3. Study of Power Generation Loss Decrease in Small Gas Engine Cogeneration.

Ueno, M. ; Eguchi, H. ; Enomoto, T. ; Ogawa, M.

Pub. info.:	2008 Small Engine Technology Conference and Exhibition : SAE technical paper. 2008. Warrendale, Penn.. Society of Automotive Engineers
Title of ser.:	Society of Automotive Engineers technical paper series
Ser. no.:	2008

Conference Proceedings

4. Advanced image placement performance for the current EPL masks [6151-53]

Eguchi, H. ; Sugimura, H. ; Koike, K. ; Sakaue, H. ; Arimoto, H. ; Ogawa, K. ; Susa, T. ; Kunitani, S. ; Kurosu, T. ; Yoshii, T. ; Itoh, K.

Pub. info.:	Emerging Lithographic Technologies X. pp.61511G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6151

Conference Proceedings

5. Resolution improvement of EPL stencil mask using thin membrane [6151-52]

Sugimura, H. ; Eguchi, H. ; Norimoto, M. ; Negishi, Y. ; Yonekura, I. ; Ito, K. ; Tamura, A. ; Koba, F. ; Arimoto, H

Pub. info.:	Emerging Lithographic Technologies X. pp.61511F-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6151

Conference Proceedings

6. 200-mm EPL stencil mask fabrication by using SOI substrate

Sugimura, H. ; Eguchi, H. ; Yoshii, T. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.925-933, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

7. Low-stress stencil masks using SOI substrates for EPL and LEEPL

Eguchi, H. ; Kurosu, T. ; Yoshii, T. ; Sugimura, H. ; Itoh, K. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.879-887, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

8. Modeling LEEPL mask fabrication processes

Azkorra, X. ; Mikkelson, A.R. ; Engelstad, R.L. ; Lovell, E.G. ; Chang, J. ; Sohn, J. ; Nataraju, M. ; Eguchi, H.

Pub. info.:	Emerging Lithographic Technologies VIII. pp.1068-1079, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5374

Conference Proceedings

9. Low-stress stencil masks using a doping method

Eguchi, H. ; Kurosu, T. ; Yoshii, T. ; Sugimura, H. ; Itoh, K. ; Tamura, A.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.871-879, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

10.

Conference Proceedings

10. Stencil pattern accuracy of EPL masks [5853-77]

Sugimura, H. ; Yamazaki, T. ; Susa, T. ; Negishi, Y. ; Yoshii, T. ; Eguchi, H. ; Tamura, A.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.884-891, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

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Author: Eguchi, H.