1.

Conference Proceedings
Conference Proceedings
1. UV cleaning of contaminated 157-nm reticles
Bloomstein,T.M. ; Liberman,V. ; Rothschild,M. ; Efremow Jr.,N.N. ; Hardy,D.E. ; Palmacci,S.T.
Pub. info.: Optical Microlithography XIV.  4346  pp.669-675,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
2.

Conference Proceedings
Conference Proceedings
2. Marathon evaluation of optical materials for 157-nm lithography
Liberman,V. ; Rothschild,M. ; Efremow Jr.,N.N. ; Palmacci,S.T. ; Sedlacek,J.H.C. ; Peski,C.K.Van ; Orvek,K.J.
Pub. info.: Optical Microlithography XIV.  4346  pp.45-51,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346