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Cost and revenue impact of advanced process control (APC) with an emphasis on run-to-run control (R2R)

Author(s):
Stanley, T.D. ( International SEMATECH (USA) )
Markle, R.J. ( Advanced Micro Devices, Inc. (USA) )
Eck, B.V. ( International SEMATECH (USA) )
Cusson, B.K. ( Advanced Micro Devices, Inc. (USA) )
Purdy, M.A. ( Advanced Micro Devices, Inc. (USA) )
Stanley, K.J. ( International SEMATECH (USA) )
1 more
Publication title:
Advanced process control and automation : 27 February, 2003, Santa Clara, California, USA
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5044
Pub. Year:
2003
Page(from):
130
Page(to):
138
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819448491 [0819448494]
Language:
English
Call no.:
P63600/5044
Type:
Conference Proceedings

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