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Conference Proceedings

1. Improvement of front-end process overlay in 60nm DRAM

Y. Hwang ; W. Ma ; E. Kang ; C. Lim ; S. Moon ; S. An ; K. Rhe

Pub. info.:	Metrology, inspection, and process control for microlithography XXI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6518

Conference Proceedings

2. Hardware, materials, and parameters optimization for improvement of immersion overlay

W. Ma ; Y. Hwang ; E. Kang ; S. Park ; J. Kang ; C. Lim ; S. Moon

Pub. info.:	Metrology, inspection, and process control for microlithography XXI. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6518

Conference Proceedings

3. Issues and challenges of double patterning lithography in DRAM

S. Kim ; S. Koo ; J. Choi ; Y. Hwang ; J. Park ; E. Kang ; C. Lim ; S. Moon ; J. Kim

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520