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Conference Proceedings

1. Three-dimensional rigorous simulation of mask-induced polarization

Zhou, W. ; Yu, J. ; Lo, J. ; Liu, J. ; Tjhin, H. ; Dziura, T. G.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.567-575, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

2. Feasibility of improving CD-SEM-based APC system for exposure tool by spectroscopic-ellipsometry-based APC system

Lin, W. ; Liao, S. ; Tsai, R. ; Yeh, M. ; Hsieh, C. ; Yu, Y. ; Lin, B. S. ; Fu, S. ; Dziura, T. G.

Pub. info.:	Data analysis and modeling for process control II : 3-4 March, 2005, San Jose, California, USA. pp.138-144, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5755

Conference Proceedings

3. Proximity matching for 1 93nm scanner using scatterometry

Zhou, W. ; Yu, J. ; Lo, J. ; Liu, J. ; Tjhin, H. ; Dziura, T. G.

Pub. info.:	Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1249-1259, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5754

Conference Proceedings

4. Scatterometry measurements of line end shortening structures for focus-exposure monitoring [6152-70]

Hung, K. ; Cheng, Y. F. ; Sun, J. W. ; Lin, B. S. M. ; Fu, S. ; Dziura, T. G. ; Cusacovich, M. ; Mieher, W. D

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XX. pp.61521W-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6152