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25 results

Conference Proceedings

1. 0.11-μm imaging in KrF lithography using dipole illumination

Eurlings,M. ; Setten,E.van ; Torres,J.A. ; Dusa,M.V. ; Socha,R.J. ; Capodieci,L. ; Finders,J.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.266-278, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

2. Study of mask aerial images to predict CD proximity and line end shortening of resist patterns

Dusa,M.V. ; Ridley,A. ; So,B.

Pub. info.:	17th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.148-159, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4349

Conference Proceedings

3. Overlay target design characterization and optimization for tungsten CMP

Hsu,S.D. ; Dusa,M.V. ; Vlassak,J. ; Harker,C. ; Zimmerman,M.

Pub. info.:	Metrology, inspection, and process control for microlithography XII : 23-25 February 1998, San Clara, California. pp.360-370, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3332

Conference Proceedings

4. Nonstandard bleaching behavior in DNQ systems:modeling and lithographic consequences

Nicolau,D.V. ; Yoshikawa,S. ; Dusa,M.V.

Pub. info.:	Device and process technologies for MEMS and microelectronics : 27-29 October 1999, Royal Pines Resort, Queensland, Australia. pp.274-281, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3892

Conference Proceedings

5. CD control comparison for sub-0.18-ｦﾌm patterning using 248-nm lithography and strong resolution enhancement techniques

Vandenberghe,G. ; Marschner,T. ; Ronse,K. ; Socha,R.J. ; Dusa,M.V.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.228-238, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

6. KrF lithography for 130 nm

Finders,J. ; Schoot,J.B.van ; Vanoppen,P. ; Dusa,M.V. ; Socha,R.J. ; Vandenberghe,G. ; Ronse,K.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.192-205, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

7. Bionanostructures built on e-beam-assisted functionalized polymer surfaces

Nicolau,D.V. ; Taguchi,T. ; Dusa,M.V. ; Yoshikawa,S.

Pub. info.:	Smart materials, structures, and integrated systems : 11-13 December 1997, Adelaide, Australia. pp.222-227, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3241

Conference Proceedings

8. CD error sensitivity to "sub-killer" defects at k1 near 0.4:II

Nakagawa,K.H. ; Chen,J.F. ; Socha,R.J. ; Dusa,M.V. ; Laidig,T.L. ; Wampler,K.E. ; Caldwell,R.F. ; Broeke,D.J.van den

Pub. info.:	19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California. Part2 pp.893-904, 1999. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3873

Conference Proceedings

9. Dual damascene photo process using negative-tone resist

Shi,X. ; Fung,A.C. ; Hsu,S. ; Li,Z. ; Nguyen,T. ; Socha,R.J. ; Conley,W.E. ; Dusa,M.V.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part2 pp.835-842, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

10.

Conference Proceedings

10. Forbidden pitches for 130-nm lithography and below

Socha,R.J. ; Dusa,M.V. ; Capodieci,L. ; Finders,J. ; Chen,J.F. ; Flagello,D.G. ; Cummings,K.D.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1140-1155, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

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Author: Dusa,M.V.