Search records | 東京工業大学附属図書館文献データベース

You can search for articles included in proceedings of international conferences and technical papers which Tokyo Tech Library holds.
Tokyo Tech members can obtain tables of contents of 17,000 foreign journals by SwetScan. Tokyo Tech Library does not cover all of them.
List of Searchable Databases

Clear Form

Search for other sites by same keyword(s).

CiNii Books

NDL Search

WebcatPlus

amazon

カーリル

WorldCat

Filter

Title:

Author:

ISBN / ISSN / Paper No:

Source Title:

Publisher:

Publication Year:

～

Clear Form

Type:

Conference Proceedings

Technical Paper

Academic Journal

Select: Check all | Remove all

Sort order

10 results

Conference Proceedings

1. Intra-wafer CDU characterization to determine process and focus contributions based on scatterometry metrology

Dusa, M. ; Moerman, R. ; Singh, B. ; Friedberg, P. ; Hoobler, R. ; Zavecs, T.

Pub. info.:	Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA. pp.93-104, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5378

Conference Proceedings

2. An integrated lithography concept with application on 45-nm % pitch flash memory devices (Invited Paper) [6154-21]

Dusa, M. ; Engelen, A. ; Finders, J.

Pub. info.:	Optical Microlithography XIX. pp.61540L-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6154

Conference Proceedings

3. Aberration's impact on subresolution contact hole process windows in ultrathin imaging resist

Reilly, M.T. ; Finders, J. ; Dusa, M.

Pub. info.:	Optical Microlithography XVI. Part One pp.610-617, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

4. Compensating measured intra-wafer ring oscillator stage delay with intra-wafer exposure dose corrections [6152-71]

Verhaegen, S. ; Nackaerts, A. ; Dusa, M. ; Carpaij, R. ; Vandenberghe, G. ; Finders, J.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XX. pp.61521Y-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6152

Conference Proceedings

5. Device manufacturing critical evaluation of focus analysis methods

Roberts, W.R. ; Mcuillan, M. ; Louka, M.N. ; Zavecz, T. ; Reynolds, P. ; Dusa, M.

Pub. info.:	Optical Microlithography XVII. pp.1929-1940, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

6. Interferometric-probe aberration monitors: aerial image and in-resist performance

Robins, G.C. ; Dusa, M. ; Geh, B. ; Neureuther, A.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.309-317, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

7. Optical lithography in the sub-50-nm regime

Flagello, D.G. ; Arnold, B. ; Hansen, S. ; Dusa, M. ; Socha, R.J. ; Mulkens, J. ; Garreis, R.

Pub. info.:	Optical Microlithography XVII. pp.21-33, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

8. Interferometric-probe aberration monitor performance in the production environment

Robins, G.C. ; Neureuther, A.R. ; Dusa, M. ; Kye, J.

Pub. info.:	Optical Microlithography XVII. pp.1971-1982, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5377

Conference Proceedings

9. Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75]

Park, J. ; Hsu, S. ; Van Den Broeke, D. ; Chen, J. F. ; Dusa, M. ; Socha, R. ; Finders, J. ; Vleeming, B. ; van Oosten, A. ; Nikolsky, P. ; Wiaux, V. ; Hendrickx, E. ; Bekaert, J. ; Vandenberghe, G.

Pub. info.:	Photomask Technology 2006. pp.634922-634922, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

10.

Conference Proceedings

10. Automatic pitch decomposition for improved process window when printing dense features at keff<0.20 [6283-102]

Huckabay, J. ; Staud, W. ; Naber, R. ; Dusa, M. ; Flagello, D. ; Socha, R.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XIII. pp.62830T-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6283

Select: Check all | Remove all

Sort order

10 results

Filtering by:

Author: Dusa, M.