1.

Conference Proceedings
Conference Proceedings
1. Experimental study of line-end shortening
Shi, X. ; Socha, R. J. ; Bendik, J. ; Dusa, M. V. ; Conley, W. ; Su, B.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.777-784,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. Resolution enhancement with high-transmission attenuating phase-shift masks
Socha, R. J. ; Conley, W. E. ; Shi, X. ; Dusa, M. V. ; Petersen, J. S. ; Chen, F. ; Wampler, K. E. ; Laidig, T. L. ; Caldwell, R. F.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.290-314,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
3.

Conference Proceedings
Conference Proceedings
3. Halftone biasing OPC technology: an approach for achieving fine bias control on raster-scan systems
Nakagawa, K. H. ; Chen, J. F. ; Socha, R. J. ; Laidig, T. L. ; Wampler, K. E. ; Van Den Broeke, D. ; Dusa, M. V. ; Caldwell, R. F.
Pub. info.: Photomask and X-Ray Mask Technology VI.  pp.315-323,  1999.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3748
4.

Conference Proceedings
Conference Proceedings
4. Process results using automatic pitch decomposition and double patterning technology (DPT) at k1eff <0.20 [6349-36]
Huckabay, J. ; Staud, W. ; Naber, R. ; van Oosten, A. ; Nikolski, P. ; Hsu, S. ; Socha, R. J. ; Dusa, M. V. ; Flagello, D.
Pub. info.: Photomask Technology 2006.  pp.634910-634911,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
5.

Conference Proceedings
Conference Proceedings
5. Contact and via hole mask design optimization for 65-nm technology node
Van Den Broeke, D. ; Shi, X. ; Socha, R. ; Laidig, T. ; Hollerbach, U. ; Wampler, K. E. ; Hsu, S. ; Chen, J. F. ; Corcoran, N. P. ; Dusa, M. V. ; Park, J. C.
Pub. info.: 24th Annual BACUS Symposium on Photomask Technology.  pp.680-690,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5567