In-line overlay measurements for advanced photolithography
- Author(s):
- Rouchouze,E. ( SGS-Thomson )
- Burlet,D.
- Dumant,J.-M.
- Publication title:
- Metrology, Inspection, and Process Control for Microlithography X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 2725
- Pub. Year:
- 1996
- Page(from):
- 331
- Page(to):
- 344
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421012 [0819421014]
- Language:
- English
- Call no.:
- P63600/2725
- Type:
- Conference Proceedings
Similar Items:
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
9
Conference Proceedings
Advanced method for run-to-run control of photolithography overlay registration in high-mix semiconductor production
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
Conference Proceedings
The challenges of transitioning from linear to high-order overlay control in advanced lithography
Society of Photo-optical Instrumentation Engineers |