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Conference Proceedings

1. Adjustment of bilayer optical properties and the effect on imaging and etching performance

Neisser,M.O. ; Biafore,J.J. ; Foster,P. ; Spaziano,G. ; Sarubbi,T.R. ; Driessche,V.Van ; Grozev,G. ; Tzviatkov,P.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.942-951, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

2. Characterization and optimization of positive-tone DUV resists on TiN substrates

Zandbergen,P. ; Ansem,W.Gehoel-van ; Vandenberghe,G. ; Driessche,V.Van ; Vloeberghs,H.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.314-323, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

3. Low-temperature 193-nm resist reflow process for 100-nm generation contact patterning

Driessche,V.Van ; Lucas,K. ; Roey,F.Van ; Grozev,G. ; Tzviatkov,P.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.396-407, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

4. Optical proximity effects and correction strategies for chemical-amplified DUV resists

Beeck,M.Op de ; Bruggeman,B. ; Botermans,H. ; Driessche,V.Van ; Yen,A. ; Tritchkov,A. ; Jonckheere,R. ; Ronse,K. ; hove,L.Van den

Pub. info.:	Optical Microlithography IX. Part2 pp.622-633, 1996. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	2726