1.

Conference Proceedings
Conference Proceedings
1. Evaluating design for manufacturing with process capability analysis
van Wingerden, J. ; Le Cam, L. ; Garg, M. ; Aksenov, Y. ; Dirksen, P.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.340-350,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
2.

Conference Proceedings
Conference Proceedings
2. Aerial image based lens metrology for wafer steppers [6154-34]
Dirksen, P. ; Braal, J. J. M. ; Janssen, A. J. E. M. ; Leeuwestein, A. ; Matsuyama, T. ; Noda, T.
Pub. info.: Optical Microlithography XIX.  pp.61540X-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
3.

Conference Proceedings
Conference Proceedings
3. Experimental determination of lens aberrations from the intensity point-spread function in the focal region
Dirksen, P. ; Braat, J.J.M. ; Janssen, A.J.E.M. ; Juffermans, C.A.H. ; Leeuwestein, A.
Pub. info.: Optical Microlithography XVI.  Part One  pp.1-10,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
4.

Conference Proceedings
Conference Proceedings
4. Lithographic process optimization using process capability analysis
Wingerden, J. ; Dirksen, P. ; Juffermans, C.A.H. ; Trouiller, Y.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.882-893,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
5.

Conference Proceedings
Conference Proceedings
5. Aberration determination in early 157-nm exposure system
Smith, B.W. ; Conley, W. ; Garza, C.M. ; Meute, J. ; Miller, D.A. ; Rich, G.K. ; Graffenberg, V. ; Dean, K.R. ; Patel, S. ; Ford, A. ; Foster, J. ; Moers, M.H. ; Cummings, K.D. ; Webb, J.E. ; Dewa, P.G. ; Zerrade, A. ; McDonald, S.S. ; Hughes, G.P. ; Dirksen, P.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1635-1643,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
6.

Conference Proceedings
Conference Proceedings
6. Characterization of a projection lens using the extended Nijboer-Zernike approach
Dirksen, P. ; Braat, J.J. ; De Bisschop, P. ; Janssen, A.J.E.M. ; Juffermans, C.A. ; Williams, A.M.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1392-1399,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
7.

Conference Proceedings
Conference Proceedings
7. Determination of resist parameters using the extended Nijboer-Zernike theory
Dirksen, P. ; Braat, J. ; Janssen, A.J.E.M. ; Leeuwestein, A. ; Kwinten, H. ; Van Steenwinckel, D.
Pub. info.: Optical Microlithography XVII.  pp.150-159,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377