1.

Conference Proceedings
Conference Proceedings
1. Influence of photoresist feature geometry on ECR plasma-etched HgCdTe trenches
Benson, J.D. ; Stoltz, A.J., Jr. ; Kaleczyc, A.W. ; Martinka, M. ; Almeida, L.A. ; Boyd, P.R. ; Dinan, J.H.
Pub. info.: Materials for infrared detectors II : 8-9 July 2002 ,Seattle, Washington, USA.  pp.129-135,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4795
2.

Conference Proceedings
Conference Proceedings
2. Advanced HgCdTe focal plane arrays
Chu, M. ; Gurgenian, H.K. ; Mesropian, S. ; Terterian, S. ; Wang, C.C. ; Benson, J.D. ; Dinan, J.H. ; Becker, L.S.R.
Pub. info.: Infrared technology and applications XXIX : 21-25 April 2003, Orlando, Florida, USA.  pp.103-110,  2003.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5074
3.

Conference Proceedings
Conference Proceedings
3. Low Temperature Integration of CdZnTe(211)B/Si(100) by Wafer Bonding
Huang, J. ; Cha, D.K. ; Kaleczyc, A. ; Dinan, J.H. ; Carpenter, R.W. ; Kim, M.J.
Pub. info.: Semiconductor wafer bonding : science, technology, and applications : proceedings of the international symposia.  pp.128-133,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-02
4.

Conference Proceedings
Conference Proceedings
4. Effects Of Substrate Temperature And Atomic Hydrogen Flow On The Mircocrystallinity Of Evaporated Hydrogenated Silicon Films
Stoltz, A.J. ; Mason, Whitney ; Benson, J.D. ; Dinan, J.H. ; McCormack, K. ; Kaleczyc, A.
Pub. info.: Amorphous and heterogeneous silicon-based films - 2002 : symposium held April 2-5, 2002, San Francisco, California, U.S.A..  pp.67-76,  2002.  Warrendale.  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 715
5.

Conference Proceedings
Conference Proceedings
5. Fullerene incorporation in DNQ Novolak photoresist for increasing plasma etch resistance
Benson, J.D. ; Stoltz, A.J., Jr. ; Kaleczyc, A.W. ; Dinan, J.H.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.1224-1227,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690