Dilliway, G. D. M. ; Smith, A. J. ; Hamilton, J. J. ; Xu, L. ; McNally, P. J. ; Cooke, G. ; Kheyrandish, H. ; Cowern, N. E. B.
Pub. info.:
Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.497-504, 2005. Pennington, NJ. Electrochemical Society
Dilliway, G. D. M. ; Willoughby, A. F. W. ; Bonar, J. M.
Pub. info.:
Morphological and compositional evolution of heteroepitaxial semiconductor thin films : symposium held April 24-27, 2000, San Francisco, California. pp.265-, 2000. Warrendale, Pennsylvania.. MRS-Materials Research Society