1.

Conference Proceedings
Conference Proceedings
1. Mighty high-T lithography for 65-nm generation contacts
Conley, W. ; Montgomery, P.K. ; Lucas, K. ; Litt, L.C. ; Maltabes, J.G. ; Dieu, L. ; Hughes, G.P. ; Mellenthin, D.L. ; Socha, R.J. ; Fanucchi, E.L. ; Verhappen, A. ; Wampler, K.E. ; Yu, L. ; Schaefer, E. ; Cassel, S. ; Kuijten, J.P. ; Pijnenburg, W. ; Wiaux, V. ; Vandenberghe, G.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1210-1219,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. UV light with oxygen treatment of phase shift photoblank for phase and transmission control: applicable to MxSi(1-x)OyN(y-1)
Chovino, C.M. ; Dieu, L.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.51-57,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
3.

Conference Proceedings
Conference Proceedings
3. Semi-aqueous solvent applications for 193-nm EAPSM resist strip
Reyes, J.R. ; Jackson, C. ; Dieu, L. ; Bowers, W. ; Stevens, R.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.600-605,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
4.

Conference Proceedings
Conference Proceedings
4. Advanced 193 tri-tone EAPSM (9% to 18%) for 65-nm node
Dieu, L. ; Fanucchi, E.L. ; Hughes, G.P. ; Maltabes, J.G. ; Mellenthin, D.L. ; Conley, W. ; Litt, L.C. ; Lucas, K. ; Socha, R.J. ; Wampler, K.E. ; Verhappen, A. ; Kiuten, J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1227-1233,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
5.

Conference Proceedings
Conference Proceedings
5. 193-nm haze contamination: a close relationship between mask and its environment
Johnstone, E. ; Dieu, L. ; Chovino, C. ; Reyes, J. ; Hong, D. ; Krishnan, P. ; Coburn, D. ; Capella, C.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.440-448,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
6.

Conference Proceedings
Conference Proceedings
6. Influence of antireflection coatings in ArF lithography
La Fontaine, B.M. ; Pawloski, A.R. ; Acheta, A. ; Deng, Y. ; Levinson, H.J. ; Spence, C. ; Chovino, C. ; Dieu, L. ; Johnstone, E. ; Kalk, F.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.995-1005,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
7.

Conference Proceedings
Conference Proceedings
7. Manufacturing of ArF chromeless hard shifter for 65-nm technology
Park, K.-T. ; Dieu, L. ; Hughes, G.P. ; Green, K.G. ; Croffie, E.H. ; Taravade, K.N.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.1006-1016,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
8.

Conference Proceedings
Conference Proceedings
8. EUV mask making: an approach based on the direct patterning of the EUV reflector
Chovino, C. ; Dieu, L. ; Johnstone, E. ; Reyes, J. ; La Fontaine, B.M. ; Levinson, H.J. ; Pawloski, A.R.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.566-572,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256
9.

Conference Proceedings
Conference Proceedings
9. Architectural choices for EUV lithography masks: patterned absorbers and patterned reflectors
La Fontaine, B. ; Pawloski, A.R. ; Deng, Y. ; Chovino, C. ; Dieu, L. ; Wood, O.R., II ; Levinson, H.J.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.300-310,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
10.

Conference Proceedings
Conference Proceedings
10. Immersion system process optimization for 248-nm and 193-nm photomasks: binary and EAPSM
Chen, G. ; Reyes, J. ; Wood, J.L. ; Kashkoush, I. ; Dieu, L. ; Novak, R.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.518-525,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256