1.

Conference Proceedings
Conference Proceedings
1. Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH
Meute, J. ; Rich, G.K. ; Hien, S. ; Dean, K.R. ; Gondran, C. ; Cashmore, J.S. ; Ashworth, D. ; Webb, J.E. ; Rich, L.R. ; Dewa, P.G.
Pub. info.: Optical Microlithography XV.  Part One  pp.724-733,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
2.

Conference Proceedings
Conference Proceedings
2. Aberration determination in early 157-nm exposure system
Smith, B.W. ; Conley, W. ; Garza, C.M. ; Meute, J. ; Miller, D.A. ; Rich, G.K. ; Graffenberg, V. ; Dean, K.R. ; Patel, S. ; Ford, A. ; Foster, J. ; Moers, M.H. ; Cummings, K.D. ; Webb, J.E. ; Dewa, P.G. ; Zerrade, A. ; McDonald, S.S. ; Hughes, G.P. ; Dirksen, P.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1635-1643,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. 157-nm system test for high-NA lithographic lens systems
Schreiber, H. ; Dewa, P.G. ; Hanford, K.E. ; Ligenza, R.L. ; Rich, L.R. ; Tompkins, P.J.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1675-1685,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Laser resistance of fused silica for microlithography: experiments and models
Moll, J. ; Dewa, P.G.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1734-1741,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Optical metrology for 193-nm immersion objective characterization
Aronstein, D. ; Bentley, J. ; Dewa, P.G. ; Dunn, M. ; Schreiber, H. ; Nguyen, T. ; Webb, J.E.
Pub. info.: Optical Microlithography XVII.  pp.836-845,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377