Ehrlich, C. ; Edinger, K. ; Hofmann, T. ; Degel, W.
Pub. info.:
EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany. pp.62810M-, 2006. Bellingham, Wash.,. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Yasui, T. ; Higashikawa, I. ; Kuschnerus, P. ; Degel, W. ; Boehm, K. ; Zibold, A.M. ; Kobiyama, Y. ; Urbach, J.-P. ; Schilz, C.M. ; Teuber Semmler, S.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XI. pp.743-750, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology XII. pp.361-370, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering