1.

Conference Proceedings
Conference Proceedings
1. Image performance and mask characterization of 157-nm alternating phase-shifting mask
Chen, Y.-T. ; Meute, J. ; Dean, K.R. ; Stark, D.R. ; Schilz, C.M. ; Dettmann, W. ; Koehle, R. ; Schiessl, B. ; Degel, W.
Pub. info.: Optical Microlithography XVI.  Part One  pp.618-628,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
2.

Conference Proceedings
Conference Proceedings
2. Contamination and degradation of 157-nm stepper optical components: field experience at International SEMATECH
Meute, J. ; Rich, G.K. ; Hien, S. ; Dean, K.R. ; Gondran, C. ; Cashmore, J.S. ; Ashworth, D. ; Webb, J.E. ; Rich, L.R. ; Dewa, P.G.
Pub. info.: Optical Microlithography XV.  Part One  pp.724-733,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. Aberration determination in early 157-nm exposure system
Smith, B.W. ; Conley, W. ; Garza, C.M. ; Meute, J. ; Miller, D.A. ; Rich, G.K. ; Graffenberg, V. ; Dean, K.R. ; Patel, S. ; Ford, A. ; Foster, J. ; Moers, M.H. ; Cummings, K.D. ; Webb, J.E. ; Dewa, P.G. ; Zerrade, A. ; McDonald, S.S. ; Hughes, G.P. ; Dirksen, P.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1635-1643,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
4.

Conference Proceedings
Conference Proceedings
4. Polyhedral oligomeric silsesquioxane (POSS) based resist materials for 157-nm lithography
Tegou, E. ; Bellas, V. ; Gogolides, E. ; Argitis, P. ; Dean, K.R. ; Eon, D. ; Cartry, G. ; Cardinaud, C.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.453-461,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
5.

Conference Proceedings
Conference Proceedings
5. Parameter extraction for 157-nm photoresists
Bendik, J.J. ; Conley, W. ; Miller, D.A. ; Zimmerman, P. ; Dean, K.R. ; Petersen, J.S. ; Byers, J.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part Two  pp.988-996,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690