Amblard, G. R. ; Zandbergen, P. ; McCallum, M. ; Stephen, A. ; Byers, J. D. ; Dean, K. R. ; Meute, J. ; Nelson, C. M.
Pub. info.:
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.810-827, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California. pp.1315-1322, 1999. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering