1.

Conference Proceedings
Conference Proceedings
1. Hard pellicle investigation for 157-nm lithography: impact on overlay
Bruls, R. ; Uitterdijk, T. ; Cicilia, O. ; De Bisschop, P. ; Kocsis, M. K. ; Grenville, A. ; Van Peski, C. K. ; Engelstad, R. L. ; Chang, J. ; Cotte, E. P. ; Okada, K. ; Ohta, K. ; Mishiro, H. ; Kikugawa, S.
Pub. info.: 20th European Conference on Mask Technology for Integrated Circuits and Microcomponents.  pp.1-11,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5504
2.

Conference Proceedings
Conference Proceedings
2. Rigorous mask modeling using waveguide and FDTD methods: an assessment for typical hyper-NA imaging problems [6283-116]
Erdmann, A. ; Evanschitzky, P. ; Citarella, G. ; Fuhner, T. ; De Bisschop, P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.628319-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
3.

Conference Proceedings
Conference Proceedings
3. Validity of the Hopkins approximation in simulations of hyper NA(NA>l) line-space structures for an attenuated PSM mask [6154-16]
Erdmann, A. ; Citarella, G. ; Evanschitzky, P. ; Schermer, H. ; Philipsen, V. ; De Bisschop, P.
Pub. info.: Optical Microlithography XIX.  pp.61540g-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
4.

Conference Proceedings
Conference Proceedings
4. Characterization of a projection lens using the extended Nijboer-Zernike approach
Dirksen, P. ; Braat, J.J. ; De Bisschop, P. ; Janssen, A.J.E.M. ; Juffermans, C.A. ; Williams, A.M.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1392-1399,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
5.

Conference Proceedings
Conference Proceedings
5. Optical path and image performance monitoring of a full-field 157-nm scanner
Wells, G. ; Hermans, J. ; Watso, R. ; Kang, Y.-S. ; Morton, R. ; Kocsis, M.K. ; Okoroanyanwu, U. ; De Bisschop, P. ; Stepanenko, N. ; Ronse, K.G.
Pub. info.: Optical Microlithography XVII.  pp.91-98,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
6.

Conference Proceedings
Conference Proceedings
6. Initial assessment of the lithographic impact of the use of hard pellicles: an overview
De Bisschop, P. ; Kocsis, M.K. ; Bruls, R. ; Grenville, A. ; Van Peski, C.
Pub. info.: Optical Microlithography XVII.  pp.116-123,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
7.

Conference Proceedings
Conference Proceedings
7. Initial assessment of the lithographic impact of the use of a hard pellicle on wafer distortion
Kocsis, M.K. ; De Bisschop, P. ; Bruls, R. ; Grenville, A. ; Van Peski, C.
Pub. info.: Optical Microlithography XVII.  pp.1679-1688,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377