1.

Conference Proceedings
Conference Proceedings
1. Study of Pulsed RF DPN Process Parameters for 65 um node MOSFET Gate Dielectrics
Rothschild, A. ; Kraus, P.A. ; Chua, T.C. ; Nouri, F. ; Cubaynes, F.N. ; Veloso, A. ; Mertens, S. ; Date, L. ; Schreutelkamp, R. ; Schaekers, M.
Pub. info.: Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A..  pp.49-56,  2004.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 811
2.

Conference Proceedings
Conference Proceedings
2. 13 High-k Gate Stack Engineering - towards Meeting Low Standby Power and High Performance Targets
De Gendt, S. ; Brunco, D. ; Caymax, M. ; Canard, T. ; Date, L. ; Delabie, A. ; Deweerd, W. ; Groeseneken, G. ; Houssa, M. ; Hyun, S. ; Kaushik, V. ; Kubicek, S. ; Maes, J. ; Pantisano, L. ; Ragnarsson, L. ; Rohr, E. ; Schram, T. ; Shimamoto, Y. ; Sleeckx, E. ; Vandervorst, W. ; Van Elshocht, S. ; Yamamoto, K. ; Witters, T. ; Zhao, C. ; Zimmerman, P. ; Heyns, M. (Invited Paper)
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.109-117,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
3.

Conference Proceedings
Conference Proceedings
3. Growth and Physical Properties of MOCVD-Deposited Hafnium Oxide Films and Their Properties on Silicon
Elshocht, S.Van ; Caymax, M. ; Gendt, S.De ; Conard, T. ; Petry, J. ; Claes, M. ; Witters, T. ; Zhao, C. ; Brijs, B. ; Richard, O. ; Bender, H. ; Vandervorst, W. ; Carter, R. ; Kluth, J. ; Date, L. ; Pique, D. ; Heyns, M.M.
Pub. info.: Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A..  pp.197-202,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 745
4.

Conference Proceedings
Conference Proceedings
4. High-k Materials for Advanced Gate Stack Dielectrics: A Comparison of ALCVD and MOCVD as Deposition Technologies
Caymax, Matty ; Bender, H. ; Brijs, B. ; Conard, T. ; Gendt, S. De ; Delabie, A. ; Heyns, M. ; Onsia, B. ; Ragnarsson, L. ; Richard, O. ; Vandervorst, W. ; Elshocht, S. Van ; Zhao, C. ; Maes, J. W. ; Date, L. ; Pique, D. ; Young, E. ; Tsai, W. ; Shimamoto, Y.
Pub. info.: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.47-58,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 765
5.

Conference Proceedings
Conference Proceedings
5. Further Optimization of Plasma Nitridation of Ultra-thin Oxides for 65 nm 236 Node MOSFETs
Kraus, P.A. ; Chua, T.C. ; Rothschild, A. ; Cubaynes, F.N ; Veloso, A. ; Mertens, S. ; Date, L. ; Baue, T.M. ; Ahmed, K.Z. ; Campbell, J. ; Noun, F. ; Cruse, J. ; Schreutelkamp, R. ; Schaekers, M.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.236-243,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01
6.

Conference Proceedings
Conference Proceedings
6. Scalability of MOCVD-Deposited Hafnium Oxide
Elshocht, S. Van ; Carter, R. ; Caymax, M. ; Claes, M. ; Conard, T. ; Date, L. ; Gendt, S. De ; Kaushik, V. ; Kerber, A. ; Kluth, J. ; Lujan, G. ; Petry, J. ; Pique, D. ; Richard, O. ; Rohr, E. ; Shimamoto, Y. ; Tsai, W. ; Heyns, M. M.
Pub. info.: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.59-64,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 765
7.

Conference Proceedings
Conference Proceedings
7. Plasma Nitridation Optimization for Sub-iSA Gate Dielectrics
Cubaynes, F.N. ; Schmitz, J. ; van der Marel, C. ; Snijders, J.H.M. ; Veloso, A. ; Rothschild, A. ; Olsen, C. ; Date, L.
Pub. info.: Silicon nitride and silicon dioxide thin insulating films VII : proceedings of the international symposium.  pp.595-604,  2003.  Pennington, N.J..  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-2