1.

Conference Proceedings
Conference Proceedings
1. Modeling of optical constants of materials comprising photolithographic masks in the VUV
Harrison,D.A. ; Lam,J.C. ; Li,G.G. ; Forouhi,A.R. ; Dao,G.T.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.844-852,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Progress in 157-nm lithography development at Intel:resists and reticles
Rao,V. ; Panning,E.M. ; Liao,L. ; Hutchinson,J.M. ; Grenville,A. ; Holl,S.M. ; Bruner,D. ; Balasubramanian,R. ; Kuse,R. ; Dao,G.T. ; Zheng,J.-F. ; Orvek,K.J. ; Langston,J.C. ; Lo,F.-C.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part2  pp.1574-1581,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
3.

Conference Proceedings
Conference Proceedings
3. Predicting mask performance by numerical simulation
Qian,Q.-D. ; Dao,G.T. ; Yan,P.-Y. ; Leon,F.A.
Pub. info.: 15th Annual BACUS Symposium on Photomask Technology and Management.  pp.473-479,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2621
4.

Conference Proceedings
Conference Proceedings
4. New approach to phase metrology for manufacturing 248-nm lithography-based embedded attenuated phase-shifting mask
Dao,G.T. ; Liu,G. ; Snyder,A. ; Farnsworth,J.N.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.359-370,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793
5.

Conference Proceedings
Conference Proceedings
5. Pellicle-induced distortions in advanced optical reticles
Semke,W.H. ; Siewert,L.K. ; Mikkelson,A.R. ; Risius,E.A. ; Tang,N. ; Engelstad,R.L. ; Lovell,E.G. ; Zheng,J.-F. ; Dao,G.T.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.207-216,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
6.

Conference Proceedings
Conference Proceedings
6. Impact of surface contamination on transmittance of modified fused silica for 157-nm lithography application
Zheng,J.-F. ; Kuse,R. ; Ramamoorthy,A. ; Dao,G.T. ; Lo,F.-C.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.767-773,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
7.

Conference Proceedings
Conference Proceedings
7. 157-nm lithography for 100-nm generation and beyond: progress and status
Dao,G.T. ; Borodovsky,Y.A.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.259-267,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186
8.

Conference Proceedings
Conference Proceedings
8. Plasma etch of AZ5206/Cr and ZEP7000/Cr for 0.18- to 0.25-ｦﾌm-generation advanced mask fabrication
Tsai,W. ; Chen,F. ; Kamna,M. ; Chegwidden,S. ; Labovitz,S.M. ; Farnsworth,J.N. ; Dao,G.T.
Pub. info.: Photomask and X-Ray Mask Technology V.  pp.149-162,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3412
9.

Conference Proceedings
Conference Proceedings
9. Mechanical analysis of hard pellicles for 157-nm lithography
Reu,P.L. ; Mikkelson,A.R. ; Schlax,M.P. ; Cotte,E.P. ; Siewert,L.K. ; Engelstad,R.L. ; Lovell,E.G. ; Dao,G.T. ; Zheng,J.-F.
Pub. info.: Optical Microlithography XIV.  4346  pp.1166-1174,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346