1.

Conference Proceedings

Conference Proceedings
Redmond, S. ; Weller, R. ; Tomasco, R. ; Keese, B. ; Spaniola, N. ; Maeda, T. ; Takenouchi, K. ; Page, L. ; Danilevsky, A. ; Williams, R. ; Berger, D. ; Ward, B.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.237-247,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752
2.

Conference Proceedings

Conference Proceedings
Bunday, B. ; Lipscomb, W. ; Allgair, J. ; Yang, K. ; Koshihara, S. ; Morokuma, H. ; Page, L. ; Danilevsky, A.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XX.  pp.61521B-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6152
3.

Conference Proceedings

Conference Proceedings
Rice, B.J. ; Crays, G.L. ; Danilevsky, A. ; Grumski, M.G. ; Koshihara, S. ; Otaka, T. ; Roberts, J.M.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.1247-1253,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375