1.

Conference Proceedings
Conference Proceedings
1. Improvements in Ultra-Thin Gate Oxide Thickness Metrology Using Rapid Optical Surface Treatment
Newcomb,R. ; Kamieniencki,E. ; Danel,A. ; Tardif,F. ; Kitagawara,K. ; Mizuno,M. ; Hirano,Y.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices and processes : joint proceedings of the symposia on ALTECH 99, satellite symposium to ESSDERC 99, Leuven, Belgium [and] the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices.  pp.441-449,  1999.  Pennington, N.J..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3895
2.

Conference Proceedings
Conference Proceedings
2. Epilayer Quality and Yield Improvement Using the Surface Charge Profiler as a Non-Destructive Technique
Nguyen,MC. ; Tower,J.P. ; Danel,A.
Pub. info.: Analytical and diagnostic techniques for semiconductor materials, devices and processes : joint proceedings of the symposia on ALTECH 99, satellite symposium to ESSDERC 99, Leuven, Belgium [and] the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices.  pp.408-418,  1999.  Pennington, N.J..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3895
3.

Conference Proceedings
Conference Proceedings
3. Extending ellipsometry capabilities for ultrathin gate oxide metrology using rapid optical surface treatment technology
Tardif,F. ; Danel,A. ; Kamieniecki,E. ; Harrington,J.
Pub. info.: Process, equipment, and materials control in integrated circuit manufacturing V : 22-23 September, 1999, Santa Clara, California.  pp.126-131,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3882
4.

Conference Proceedings
Conference Proceedings
4. Using the surface charge profiler for in-tine monitoring of doping concentration in silicon epitaxial wafer manufacturing
Tower,J.P. ; Kamieniecki,E. ; Nguyen,M.C. ; Danel,A.
Pub. info.: In-Line Methods and Monitors for Process and Yield Improvement.  pp.174-181,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3884