22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1263-1272, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Shi, X. ; Chen, J.F. ; Hsu, S. ; Van Den Broeke, D.J. ; Socha, R.J. ; Chang, C.H. ; Dai, C.-M.
Pub. info.:
22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.1304-1312, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Chang, C.-H. ; Hsieh, C.-H. ; Tzu, S.-D. ; Dai, C.-M. ; Lin, B. J. ; Pang, L. ; Qian, Q.-D. ; Chen, J.-H. ; Huang, J. H.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology IX. pp.622-629, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering