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12 results

Conference Proceedings

1. Challenges in FEOL Logic Device Integration for 32 nm Technology Node and Beyond

D. Park ; M. Chudzik ; H. Yin

Pub. info.:	ULSI process integration 5. pp.371-377, 2007. Pennington, N.J.. Electrochemical Society
Title of ser.:	ECS transactions
Ser. no.:	11(6)

Conference Proceedings

2. Present and Future of Si-Based Transistor Technology for Memories

D. Park ; B. Ryu

Pub. info.:	Silicon materials science and technology X. pp.11-26, 2006. Pennington, N.J.. Electrochemical Society
Title of ser.:	ECS transactions
Ser. no.:	2(2)

Technical Paper

3. MEMS-Based Fuel Reformer Integrated with Catalytic Combustor Using CarbonNanoTubes as Catalyst Supports

D. Park ; T. Kim ; C. Kim ; S. Kwon ; E. Yoon

Pub. info.:	AIAA meeting papers on disc. 2006. Reston, Va. American Institute of Aeronautics and Astronautics
Title of ser.:	AIAA Paper : International Energy Conversion Engineering Conference and Exhibit (IECEC)
Ser. no.:	2006

Conference Proceedings

4. A method for generating assist-features in full-chip scale and its application to contact layers of sub-70nm DRAM devices

D. Park ; S. Kim ; C. Hwang ; S. Lee ; H. Cho ; J. Moon

Pub. info.:	Optical microlithography XX. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6520

Conference Proceedings

5. Novel process proximity correction by the pattern-to-pattern matching method with DBM

D. Park ; J. Choi ; H. Yune ; C. Kim

Pub. info.:	Lithography Asia 2008. 2 pp.71403K-1-71403K-8, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	7140

Conference Proceedings

6. Optimization of BARC process for hyper-NA immersion lithography

K. Lee ; J. Lee ; S. Lee ; D. Park ; C. Bok

Pub. info.:	Advances in resist materials and processing technology XXV. 2 pp.69232R-1-69232R-9, 2008. Bellingham, Wash.. Society of Photo-optical Instrumentation Engineers
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6923

Conference Proceedings

7. Improvement of crosstalk on 5M CMOS image sensor with 1.7x1.7μm2 pixels

C. Koo ; H. Kim ; K. Paik ; D. Park ; K. Lee ; Y. Park ; C. Moon ; S. Lee ; S. Hwang ; D. Lee ; J. Kong

Pub. info.:	Ultrafast phenomena in semiconductors and nanostructure materials XI and semiconductor photodetectors IV : 22-24 January 2007, San Jose, California, USA. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6471

Conference Proceedings

8. Color balancing based upon gamut and temporal correlations

S. Kim ; H. Lee ; B. Kang ; S. Lee ; D. Park ; C. Kim

Pub. info.:	Human vision and electronic imaging XII : 29 January-1 February 2007, San Jose, California, USA. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6492

Conference Proceedings

9. Visibility improvement based on gray matching experiment between dark and ambient condition in mobile display

I. Kim ; H. Ok ; D. Park

Pub. info.:	Human vision and electronic imaging XII : 29 January-1 February 2007, San Jose, California, USA. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6492

10.

Conference Proceedings

10. Highly accurate model-based verification using SEM image calibration method

B. Cho ; D. Park ; D. Chang ; J. Choi ; C. Kim ; D. Yim ; J. Kim

Pub. info.:	Design for manufacturability through design-process integration : 28 February-2 March 2007, San Jose, California, USA. 2007. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6521

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Author: D. Park