39 Characterization of Laminated CeO2-HfO2 High-k Gate Dielectrics Deposited by Pulsed Laser Deposition
- Author(s):
Karakaya, K. Zinine, A. van Berkum, J.G.M. Croat, P. Verheijen, M.A. Rittersma, Z.M. Rijnders, G. Blank, D.H.A. - Publication title:
- Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium
- Title of ser.:
- Electrochemical Society Proceedings Series
- Ser. no.:
- 2005-05
- Pub. Year:
- 2005
- Page(from):
- 331
- Page(to):
- 338
- Pages:
- 8
- Pub. info.:
- Pennington, NJ: Electrochemical Society
- ISSN:
- 01616374
- ISBN:
- 9781566774635 [1566774632]
- Language:
- English
- Call no.:
- E23400/200505
- Type:
- Conference Proceedings
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