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15 results

Conference Proceedings

1. FEASIBILITY OF SIMOX MATERIAL QUALITY DETERMINATION USING SPECTROELLIPSOMETRY: COMPARISON WITH RAMAN AND PLANAR VIEW TRANSMISSION ELECTRON MICROSCOPY

Crean, G. M. ; Lynch, S. ; Greef, R. ; Stoemenos, J. ; Rossow, U. ; Richter, W.

Pub. info.:	Phase formation and modification by beam-solid interactions : symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A.. pp.139-144, 1992. Pittsburgh, Pa.. Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	235

Conference Proceedings

2. Selective Electroless Copper Metallization of Epoxy Substrates

Campion, L. M. ; O'Reilly, M. ; Macauley, D. J. ; Kelly, P. V. ; Crean, G. M.

Pub. info.:	Materials for mechanical and optical microsystems : symposium held December 4-5, 1996, Boston, Massachusetts,U.S.A.. pp.69-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	444

Conference Proceedings

3. Photo-Induced CVD of Tantalum Pentoxide Dielectric Films Using an Injection Liquid Source

Zhang, J-Y. ; Boyd, I. W. ; Mooney, M. B. ; Hurley, P. K. ; O'Sullivan, B. J. ; Beechinor, J. T. ; Kelly, P. V. ; Crean, G. M. ; Senateur, J-P.

Pub. info.:	Ultrathin SiO[2] and high-K materials for USLI gate dielectrics : symposium held April 5-8, 1999, in San Francisco, California, U.S.A.. pp.397-, 1999. Warrendale, PA. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	567

Conference Proceedings

4. REFLECTANCE ANISOTROPY AND SPECTROSCOPIC ELLIPSOMETRY CHARACTERISATION OF WET SILICON WAFER CLEANING

Beechinor, J. T. ; Kelly, P. V. ; Crean, G. M.

Pub. info.:	Diagnostic techniques for semiconductor materials processing : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.. pp.59-, 1994. Pittsburgh. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	324

Conference Proceedings

5. PHOTOREFLECTANCE CHARACTERISATION OF REACTIVE ION ETCHED SILICON

Murtagh, M. ; Beechinor, J. T. ; Herbert, P. A. F. ; Kelly, P. V. ; Crean, G. M. ; Jeynes, C.

Pub. info.:	Diagnostic techniques for semiconductor materials processing : Symposium held November 29-December 2, 1993, Boston, Massachusetts, U.S.A.. pp.167-, 1994. Pittsburgh. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	324

Conference Proceedings

6. Atomic-Force-Microscopy Investigation of the Morphology of a uv Photodefined Palladium Activation Layer on Alumina Ceramic and the Nucleation of Electroless Copper at the Activated Sites

Lafferty, E. J. ; Macauley, D. J. ; Kelly, P. V. ; Crean, G. M.

Pub. info.:	Thin films - structure and morphology : symposium held December 2-6, 1996, Boston, Massachusetts, U.S.A.. pp.329-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	441

Conference Proceedings

7. Ultraviolet Excimer Lamp Photoassisted Selective Palladium Activation of Coarse-Grain 96% Alumina Ceramic for Selective Electroless Copper Plating

Macauley, D. J. ; Kelly, P. V. ; Crean, G. M.

Pub. info.:	Electronic packaging materials science IX : symposium held December 2-5, 1996, Boston, Massachusetts, U.S.A.. pp.45-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	445

Conference Proceedings

8. Optical and Electrical Characterization Study of SiCl4 Reactive-Io-Etched GaAs

Murtagh, M. ; Ye, Shu-Ren ; Masterson, H. J. ; Beechinor, J. T. ; Crean, G. M. ; Auret, F. D. ; Deenapanray, P. N. K. ; Mayer, W. E. ; Goodman, S. A. ; Myburg, G.

Pub. info.:	Defects in electronic materials II : symposium held December 2-6, 1996, Boston, Massachusetts, U.S.A.. pp.75-, 1997. Pittsburgh, Penn. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	442

Conference Proceedings

9. Electrical Characterization of Defects Introduced During Plasma-Based Processing of GaAs

Auret, F. D. ; Myburg, G. ; Meyer, W. E. ; Deenapanray, P. N. K. ; Nordhoff, H. ; Murtagh, M. ; Ye, Shu-Ren ; Masterson, H. J. ; Beechinor, J. T. ; Crean, G. M.

Pub. info.:	Defects in electronic materials II : symposium held December 2-6, 1996, Boston, Massachusetts, U.S.A.. pp.51-, 1997. Pittsburgh, Penn. MRS - Materials Research Society
Title of ser.:	Materials Research Society symposium proceedings
Ser. no.:	442

10.

Conference Proceedings

10. Anisotropic Dielectric Function Properties of Semi-Insulating 4H-SiC Determined from Spectroscopic Ellipsometry

Kildemo, M. ; Mooney, M. B. ; Kelly, P. V. ; Sudre, C. ; Crean, G. M.

Pub. info.:	Silicon carbide and related materials - 1999 : ICSCRM'99, proceedings of the International Conference on Silicon Carbide and Related Materials - 1999, Research Triangle Park, North Carolina, USA, October 10-15, 1999. pp.571-574, 2000. Zuerich, Switzerland. Trans Tech Publications
Title of ser.:	Materials science forum
Ser. no.:	338-342(1)

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Author: Crean, G. M.