1.

Conference Proceedings
Conference Proceedings
1. The Effect of Oxygen on the Electrical Activation and Diffusion of Ion-Implanted Boron
Larsen, K. Kyllesbech ; Stolk, P. A. ; Privitera, V. ; Berkum, J. G. M. van ; Boer, W. B. de ; Mannino, G. ; Cowern, N. E. B. ; Huizing, H. G. A.
Pub. info.: Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A..  pp.291-,  1997.  Pittsburg, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 469
2.

Conference Proceedings
Conference Proceedings
2. Low-Energy Implantation and Transient-Enhanced Diffusion: Physical Mechanisms and Technology Implications
Cowern, N. E. B. ; Collart, E. J. H. ; Politiek, J. ; Bancken, P. H. L. ; Berkum, J. G. M. van ; Larsen, K. Kyllesbech ; Stolk, P. A. ; Huizing, H. G. A. ; Pichler, P. ; Burenkov, A. ; Gravesteijn, D. J.
Pub. info.: Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A..  pp.265-,  1997.  Pittsburg, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 469
3.

Conference Proceedings
Conference Proceedings
3. Room-Temperature Migration of Ion-Implanted Boron in Silicon
Collart, E. J. H. ; Weemers, K. ; Gravesteijn, D. J. ; Berkum, J. G. M. van ; Cowern, N. E. B.
Pub. info.: Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A..  pp.53-,  1997.  Pittsburg, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 469
4.

Conference Proceedings
Conference Proceedings
4. Ostwald Ripening of {113} Defects Precursors and Transient Enhanced Diffusion
Mannino, G. ; Cowern, N. E. B. ; Stolk, P. A. ; Roozeboom, F. ; Huizing, H. G. A. ; Berkum, J. G. M. van ; Boer, W. B. de ; Cristiano, F. ; Claverie, A. ; Jaraiz, M.
Pub. info.: Si front-end processing - physics and technology of dopant-defect interactions : symposium held April 6-9, 1999, San Francisco, California, U.S.A..  pp.163-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 568
5.

Conference Proceedings
Conference Proceedings
5. Influence of Dynamic Annealing on the Depth Distribution of Germanium Implanted in (100) Silicon at Elevated Temperatures
Nejim, A. ; Jeynes, C. ; Webb, R. P. ; Cowern, N. E. B. ; Patel, C. J.
Pub. info.: Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A..  pp.387-,  1997.  Pittsburg, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 469
6.

Conference Proceedings
Conference Proceedings
6. On the ｢紜symmetrical｢？Behavior of Transient Enhanced Diffusion in Pre-Amorphized Si Wafers
Alquier, D. ; Cowern, N. E. B. ; Pichler, P. ; Armand, C. ; Martinez, A. ; Mathiot, D. ; Omri, M. ; Claverie, A.
Pub. info.: Silicon front-end technology--materials processing and modelling, symposium held April 13-15, 1998, San Francisco, California, U.S.A..  pp.67-,  1998.  Warrendale, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 532
7.

Conference Proceedings
Conference Proceedings
7. 59 Strain Effects on Transient Enhanced Diffusion and Deactivation of Arsenic Implanted in Silicon
Dilliway, G. D. M. ; Smith, A. J. ; Hamilton, J. J. ; Xu, L. ; McNally, P. J. ; Cooke, G. ; Kheyrandish, H. ; Cowern, N. E. B.
Pub. info.: Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium.  pp.497-504,  2005.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2005-05
8.

Conference Proceedings
Conference Proceedings
8. Physics-Based Diffusion Simulations for Preamorphized Ultra-Shallow Junctions
Cowern, N. E. B. ; Colombeau, B. ; Lampin, E. ; Cristiano, F. ; Claverie, A. ; Lamrani, Y. ; Duffy, R. ; Venezia, V. ; Heringa, A. ; Wang, C. C. ; Zechner, C.
Pub. info.: CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A..  pp.199-204,  2003.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 765
9.

Conference Proceedings
Conference Proceedings
9. Defects and Diffusion in Silicon An Overview
Cowern, N. E. B. ; Mannino, G. ; Stolk, P. A. ; Theunissen, M. J. J.
Pub. info.: Si front-end processing - physics and technology of dopant-defect interactions : symposium held April 6-9, 1999, San Francisco, California, U.S.A..  pp.79-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 568