Bubke, K. ; Alles, B ; Cotte, E. ; Sczyrba, M. ; Pierrat, C.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XIII. pp.628318-628318, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology XII. pp.10-19, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Cotte, E. ; Dersch, U. ; Holfeld, C. ; Mickan, U. ; Seitz, H. ; Leutbecher, T. ; Hess, G.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XII. pp.336-344, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering