1.

Conference Proceedings
Conference Proceedings
1. Optimizing manufacturability for the 65-nm process node
Pramanik, D. ; Cote, M.L.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.326-333,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
2.

Conference Proceedings
Conference Proceedings
2. Hybrid AAPSM compliance methodology to ensure design for manufacturing
Kamat, V.G. ; Miloslavsky, A. ; Malhotra, V.K. ; Mayhew, J.P. ; Cote, M.L.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.279-289,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
3.

Conference Proceedings
Conference Proceedings
3. Assessing technology options for 65-nm logic circuits
Pramanik, D. ; Cote, M.L. ; Beaudette, K. ; Axelrad, V.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.30-41,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
4.

Conference Proceedings
Conference Proceedings
4. Lithography-driven layout of logic cells for 65-nm node
Pramanik, D. ; Cote, M.L.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.126-134,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
5.

Conference Proceedings
Conference Proceedings
5. New alternating phase-shifting mask conversion methodology using phase conflict resolution
Pierrat, C. ; Cote, M.L. ; Patterson, K.
Pub. info.: Optical Microlithography XV.  Part One  pp.325-335,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691