1.

Conference Proceedings
Conference Proceedings
1. Acid diffusion in a chemically amplified negative i-line photoresist
Connolly,J. ; Chen,K.R. ; Kwong,R.W. ; Lawson,M. ; Linehan,L.L. ; Moreau,W.M.
Pub. info.: Advances in resist technology and processing XV : 23-25 February 1998, Santa Clara, California.  Part 2  pp.1124-1131,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3333
2.

Conference Proceedings
Conference Proceedings
2. Diamond-shaped semiconductor optical amplifiers for high-power external-cavity mode-locked diode lasers (Invited Paper)
Gee,S. ; Alphonse,G.A. ; Connolly,J. ; Delfyett,P.J.,Jr.
Pub. info.: Photonic Processing Technology and Applications II.  pp.12-21,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3384