1.

Conference Proceedings
Conference Proceedings
1. CPL reticle technology for advanced device applications
Conley, W.E. ; Van Den Broeke, D.J. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K.D. ; Roman, B.J. ; Peters, R.D. ; Parker, C. ; Chen, J.F. ; Wampler, K.E. ; Laidig, T.L. ; Schaefer, E. ; Kuijten, J.-P. ; Verhappen, A. ; van de Goor, S. ; Chaplin, M. ; Kasprowicz, B.S. ; Progler, C.J. ; Robert, E. ; Thony, P. ; Hathorn, M.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.578-584,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
2.

Conference Proceedings
Conference Proceedings
2. CPL mask technology for sub-100-nm contact hole imaging
Kasprowicz, B.S. ; Conley, W.E. ; Litt, L.C. ; Van Den Broeke, D.J. ; Montgomery, P.K. ; Socha, R.J. ; Wu, W. ; Lucas, K.D. ; Roman, B.J. ; Chen, J.F. ; Wampler, K.E. ; Laidig, T.L. ; Progler, C.J. ; Hathorn, M.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.624-631,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
3.

Conference Proceedings
Conference Proceedings
3. Liquid immersion lithography: evaluation of resist issues
Hinsberg, W. ; Wallraff, G.M. ; Larson, C.E. ; Davis, B.W. ; Deline, V. ; Raoux, S. ; Miller, D. ; Houle, F.A. ; Hoffnagle, J. ; Sanchez, M.I. ; Rettner, C. ; Sundberg, L.K. ; Medeiros, D.R. ; Dammel, R.R. ; Conley, W.E.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.21-33,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
4.

Conference Proceedings
Conference Proceedings
4. Implications of immersion lithography on 193-nm photoresists
Taylor, J.C. ; Chambers, C.R. ; Deschner, R. ; LeSuer, R.J. ; Conley, W.E. ; Burns, S.D. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.34-43,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
5.

Conference Proceedings
Conference Proceedings
5. Using scanning electrochemical microscopy to probe chemistry at the solid-liquid interface in chemically amplified immersion lithography
LeSuer, R.J. ; Fan, F.-R.F. ; Bard, A.J. ; Taylor, J.C. ; Tsiartas, P. ; Willson, G. ; Conley, W.E. ; Feit, G. ; Kunz, R.R.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.115-125,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
6.

Conference Proceedings
Conference Proceedings
6. Is ArF the final wavelength?
Conley, W.E. ; Bendik, J.J.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.16-20,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
7.

Conference Proceedings
Conference Proceedings
7. Design of dissolution inhibitors for chemically amplified photolithographic systems
Chambers, C.R. ; Kusumoto, S. ; Osborn, B.P. ; Vasudev, A. ; Ootani, M. ; Walthal, L. ; McMichael, H. ; Zimmerman, P.A. ; Conley, W.E. ; Willson, C.G.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.360-368,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
8.

Conference Proceedings
Conference Proceedings
8. Contact hole reticle optimization by using interference mapping lithography (IML)
Socha, R.J. ; Van Den Broeke, D.J. ; Hsu, S.D. ; Chen, J.F. ; Laidig, T.L. ; Corcoran, N.P. ; Hollerbach, U. ; Wampler, K.E. ; Shi, X. ; Conley, W.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.516-534,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
9.

Conference Proceedings
Conference Proceedings
9. Elimination of photoresist linewidth slimming by fluorination
Garza, C.M. ; Conley, W.E.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.294-301,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
10.

Conference Proceedings
Conference Proceedings
10. Recent advances in fluorinated resists for application at 157 nm
Houlihan, F.M. ; Sakamuri, R. ; Romano, A. ; Rentkiewicz, D. ; Dammel, R.R. ; Conley, W.E. ; Miller, D.A. ; Sebald, M. ; Stepanenko, N. ; Markert, M. ; Mierau, U. ; Vermeir, I. ; Hohle, C. ; Itani, T. ; Shigematsu, M. ; Kawaguchi, E.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.134-150,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376