1.

Conference Proceedings
Conference Proceedings
1. Experimental study of line-end shortening
Shi, X. ; Socha, R. J. ; Bendik, J. ; Dusa, M. V. ; Conley, W. ; Su, B.
Pub. info.: Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California.  pp.777-784,  1999.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3678
2.

Conference Proceedings
Conference Proceedings
2. A novel post exposure bake technique to improve CD uniformity over product wafers
Taylor, J. C. ; Shayib, R. ; Goh, S. ; Chambers, C. R. ; Conley, W. ; Lin, S.-H. ; Willson, C. G.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.222-229,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
3.

Conference Proceedings
Conference Proceedings
3. Novel chemical shrinkage material for small contact hole and small space patterning
Whittaker, A. K. ; Blakey, I. ; Liu, H. ; Hill, D. J. T. ; George, G. A. ; Conley, W. ; Zimmerman, P.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.214-221,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
4.

Conference Proceedings
Conference Proceedings
4. 0.31k1 ArF lithography for 70-nm DRAM
Chumanov, G. ; Evanoff, D. D. Jr. ; Luzinov, I. ; Klep, V. ; Zdryko, B. ; Conley, W. ; Zimmerman, P.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.230-240,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
5.

Conference Proceedings
Conference Proceedings
5. polarization effects: EAPSM vs. TT EAPSM [6281-12]
Morgana, N. ; Conley, W. ; Cangemi, M. ; Cangemi, M. ; Kasprowicz, S. B.
Pub. info.: EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany.  pp.628109-,  2006.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6281
6.

Conference Proceedings
Conference Proceedings
6. A new monocyclic fluoropolymer for 157-nm and 193-nm photoresists
Houlihan, F. ; Sakamuri, R. ; Hamilton, K. ; Dimerli, A. ; Rentkiewicz, D. ; Romano, A. ; Dammel, R. R. ; Wei, Y. ; Stepanenko, N. ; Sebald, M. ; Hohle, C. ; Conley, W. ; Miller, D. ; Itani, T. ; Shigematsu, M. ; Kawaguchi, E.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.554-563,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
7.

Conference Proceedings
Conference Proceedings
7. Process, design, and optical proximity correction requirements for the 65-nm device generation
Lucas, K. ; Montgomery, P. ; Litt, L.C. ; Conley, W. ; Postnikov, S.V. ; Wu, W. ; Yuan, C.-M. ; Olivares, M. ; Strozewski, K. ; Carter, R.L. ; Vasek, J. ; Smith, D. ; Fanucchi, E.L. ; Wiaux, V. ; Vandenberghe, G. ; Toublan, O. ; Verhappen, A. ; Kuijten, J.P. ; van Wingerden, J. ; Kasprowicz, B.S. ; Tracy, J.W. ; Progler, C.J. ; Shiro, E. ; Topouzov, I. ; Wimmer, K. ; Roman, B.J.
Pub. info.: Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA.  pp.353-364,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5042
8.

Conference Proceedings
Conference Proceedings
8. Tunable transmission phase mask options for 65/45nm node gate and contact processing
Kasprowicz, B. S. ; Conley, W. ; Ham, Y.-M. ; Cangemi, M. J. ; Morgana, N. ; Cottle, R. ; Progler, C. J. ; Wu, W. ; Litt, L. C. ; Cobb, J. ; Roman, B.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1469-1477,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
9.

Conference Proceedings
Conference Proceedings
9. Applications of CPL mask technology for sub-65nm gate imaging
Litt, L. C. ; Conley, W. ; Wu, W. ; Peters, R. ; Parker, C. ; Cobb, J. ; Kasprowicz, B. S. ; van den Broeke, D. ; Park, J. C. ; Karur-Shanmugam, R.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1459-1468,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
10.

Conference Proceedings
Conference Proceedings
10. Assessment of 5-pole illumination for 65nm-node contact holes
Weisbuch, F. ; Warrick, S. ; Conley, W. ; Depre, J.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1405-1416,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754