1.

Conference Proceedings
Conference Proceedings
1. Low Energy Ion Implantation of As During Si-MBE
Collart, E. J. H. ; Gravesteijn, D. J. ; Lathouwers, E. G. C. ; Kersten, W. J.
Pub. info.: Defect and impurity engineered semiconductors and devices : symposium held April 17-21, 1995, San Francisco, California, U.S.A..  pp.115-,  1995.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 378
2.

Conference Proceedings
Conference Proceedings
2. Low-Energy Implantation and Transient-Enhanced Diffusion: Physical Mechanisms and Technology Implications
Cowern, N. E. B. ; Collart, E. J. H. ; Politiek, J. ; Bancken, P. H. L. ; Berkum, J. G. M. van ; Larsen, K. Kyllesbech ; Stolk, P. A. ; Huizing, H. G. A. ; Pichler, P. ; Burenkov, A. ; Gravesteijn, D. J.
Pub. info.: Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A..  pp.265-,  1997.  Pittsburg, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 469
3.

Conference Proceedings
Conference Proceedings
3. Room-Temperature Migration of Ion-Implanted Boron in Silicon
Collart, E. J. H. ; Weemers, K. ; Gravesteijn, D. J. ; Berkum, J. G. M. van ; Cowern, N. E. B.
Pub. info.: Defects and diffusion in silicon processing : symposium held April 1-4, 1997, San Francisco, California, U.S.A..  pp.53-,  1997.  Pittsburg, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 469
4.

Conference Proceedings
Conference Proceedings
4. A Growth Model of Stress Voids in Integrated-Circuit Metallization
Kordic, S. ; Collart, E. J. H.
Pub. info.: Materials reliability in microelectronics VII : symposium held April 8-12, 1997, San Francisco, California, U.S.A..  pp.343-,  1997.  Pittsburgh, Pa..  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 473
5.

Conference Proceedings
Conference Proceedings
5. Characterization of Low Energy Boron Implantation and Fast Ramp-Up Thermal Annealing
Collart, E. J. H. ; Cock, G. de ; Murrell, A. J. ; Foad, M. A.
Pub. info.: Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A..  pp.227-,  1998.  Pittsburgh, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 525
6.

Conference Proceedings
Conference Proceedings
6. Practical Aspects of Forming Ultra-Shallow Junctions by Sub-keV Boron Implants
Foad, M. A. ; Murrell, A. J. ; Collart, E. J. H. ; Cock, G. de ; Jennings, D. ; Current, M. I.
Pub. info.: Si front-end processing - physics and technology of dopant-defect interactions : symposium held April 6-9, 1999, San Francisco, California, U.S.A..  pp.55-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 568