Guarini, K.W ; Topol, A.W. ; Jeong, M. ; Bernstein, K. ; Xju, K. ; Joshi, R.V. ; Yu, R. ; Ski, L. ; Newport, M.R. ; Singh, D.V. ; Cohen, G.M. ; Pogge, H.B. ; Purushothaman, S. ; Haensch, W.E.
Pub. info.:
Thin film materials, processes, and reliability, plasma processing for the 100 nm node and copper interconnects with low-k inter-level dielectric films : proceedings of the international symposium. pp.390-404, 2003. Pennington, N.J.. Electrochemical Society
Materials issues in novel si-based technology : symposium held November 26-28, 2001, Boston, Massachusetts, U.S.A.. pp.53-58, 2002. Warrendale, Pa.. Materials Research Society
Silicon materials - processing characterization and reliability : symposium held April 1-5, 2002, San Francisco, California, U.S.A.. pp.35-40, 2002. Warrendale. Materials Research Society
Materials issues in novel si-based technology : symposium held November 26-28, 2001, Boston, Massachusetts, U.S.A.. pp.89-94, 2002. Warrendale, Pa.. Materials Research Society
Cohen, G.M. ; Mooney, P.M. ; Park, H. ; Cabral, C., Jr. ; Jones, E.C.
Pub. info.:
Silicon front-end junction formation technologies : symposium held April 2-4, 2002, San Francisco, California, U.S.A.. pp.89-94, 2002. Warrendale, Pa.. Materials Research Society
Mooney, P.M. ; Cohen, G.M. ; Chen, H. ; Chu, J.O. ; Klymko, N.
Pub. info.:
High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A.. pp.27-32, 2004. Warrendale, Pa.. Materials Research Society