1.

Conference Proceedings
Conference Proceedings
1. Flexible sparse and dense OPC algorithms [5853-54]
Cobb, N.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.693-702,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
2.

Conference Proceedings
Conference Proceedings
2. Application of CMO resist model to OPC and verification [6154-132]
Granik, Y. ; Cobb, N. ; Medvedev, D.
Pub. info.: Optical Microlithography XIX.  pp.61543E-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
3.

Conference Proceedings
Conference Proceedings
3. Dense OPC and verification for 45nm [6154c18]
Cobb, N. ; Dudau, D.
Pub. info.: Optical Microlithography XIX.  pp.61540I-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
4.

Conference Proceedings
Conference Proceedings
4. Study toward model-based DRC verification [5992-121]
Torres, J. A. ; Cobb, N.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59923L-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
5.

Conference Proceedings
Conference Proceedings
5. Model-based OPC considering process window aspects: a study
Schulze, S.F. ; Park, O. ; Zimmermann, R. ; Chen, M.-J. ; LaCour, P. ; Sahouria, E.Y. ; Granik, Y. ; Cobb, N.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1097-1105,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
6.

Conference Proceedings
Conference Proceedings
6. New concepts in OPC
Cobb, N. ; Granik, Y.
Pub. info.: Optical Microlithography XVII.  pp.680-690,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
7.

Conference Proceedings
Conference Proceedings
7. Universal process modeling with VTRE for OPC
Granik, Y. ; Cobb, N. ; Do, T.
Pub. info.: Optical Microlithography XV.  Part One  pp.377-394,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691