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11 results

Conference Proceedings

1. Rigorous EUV mask simulator using 2D and 3D waveguide methods

Zhu, Z. ; Lucas, K. ; Cobb, J.L. ; Hector, S.D. ; Strojwas, A.J.

Pub. info.:	Emerging Lithographic Technologies VII. 1 pp.494-503, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5037

Conference Proceedings

2. Line-edge roughness reduction and CD slimming using hardback processing

Peters, R.D. ; Lucas, K. ; Cobb, J.L. ; Parker, C. ; Patterson, K. ; McCauley, R. ; Ercken, M. ; Roey, F.V. ; Vandenbroeck, N. ; Pollentier, I.K.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XVII. 2 pp.1131-1142, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5038

Conference Proceedings

3. Estimated impact of shot noise in extreme-ultraviolet lithography

Cobb, J.L. ; Houle, F.A. ; Gallatin, G.M.

Pub. info.:	Emerging Lithographic Technologies VII. 1 pp.397-405, 2003. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5037

Conference Proceedings

4. Integration of UTR processes into MPU IC manufacturing flows

Cobb, J.L. ; Dakshina-Murthy, S. ; Parker, C. ; Luckowski, E. ; Martinez, A.M. ; Peters, R.D. ; Wu, W. ; Hector, S.D.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.277-286, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

5. Development and characterization of 193-nm ultra-thin resist process

Amblard, G.R. ; Peters, R. ; Cobb, J.L. ; Edamatsu, K.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.287-298, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

6. Novel design of att-PSM structure for extreme-ultraviolet lithography and enhancement of image contrast during inspection

Han, S.-I. ; Wasson, J.R. ; Mangat, P.J.S. ; Cobb, J.L. ; Lucas, K. ; Hector, S.D.

Pub. info.:	Emerging Lithographic Technologies VI. Part One pp.481-494, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4688

Conference Proceedings

7. EUV photoresist performance results from the VNL and the EUV LLC

Cobb, J.L. ; Dentinger, P.M. ; Hunter, L.L. ; O'Connell, D.J. ; Gallatin, G.M. ; Hinsberg, W.D. ; Houle, F.A. ; Sanchez, M.I. ; Domke, W.-D. ; Wurm, S. ; Okoroanyanwu, U. ; Lee, S.H.

Pub. info.:	Emerging Lithographic Technologies VI. Part One pp.412-420, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4688

Conference Proceedings

8. METROPOLE-3D: a three-dimensional electromagnetic field simulator for EUV masks under oblique illumination

Zhu, Z. ; Lucas, K.D. ; Cobb, J.L. ; Hector, S.D. ; Strojwas, A.J.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.585-594, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

9. Fabrication of integrated circuits with high yield using ultra-thin resist processes

Peters, R.D. ; Postnikov, S.V. ; Cobb, J.L. ; Dakshina-Murthy, S. ; Stephens, T. ; Parker, C. ; Luckowski, E. ; Martinez, A.M. Jr., ; Wu, W. ; Hector, S.D.

Pub. info.:	Advances in Resist Technology and Processing XX. 2 pp.1390-1401, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039

10.

Conference Proceedings

10. Controlling line-edge rougness to within reasonable limits

Cobb, J.L. ; Rauf, S. ; Thean, A. ; Dakshina-Murthy, S. ; Stephens, T. ; Parker, C. ; Peters, R.D. ; Rao, V.

Pub. info.:	Advances in Resist Technology and Processing XX. 1 pp.376-383, 2003. Bellingham, CA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5039

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Author: Cobb, J.L.