1.

Conference Proceedings
Conference Proceedings
1. 193nm dual layer organic BARCS for high NA immersion lithography
Montgomery, P. K. ; Peters, R. ; Garza, C. ; Cobb, J. ; Darlington, B. ; Parker, C. ; Filipiak, S. ; Babbitt, D.
Pub. info.: Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA.  pp.417-435,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5753(1)
2.

Conference Proceedings
Conference Proceedings
2. Tunable transmission phase mask options for 65/45nm node gate and contact processing
Kasprowicz, B. S. ; Conley, W. ; Ham, Y.-M. ; Cangemi, M. J. ; Morgana, N. ; Cottle, R. ; Progler, C. J. ; Wu, W. ; Litt, L. C. ; Cobb, J. ; Roman, B.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1469-1477,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Applications of CPL mask technology for sub-65nm gate imaging
Litt, L. C. ; Conley, W. ; Wu, W. ; Peters, R. ; Parker, C. ; Cobb, J. ; Kasprowicz, B. S. ; van den Broeke, D. ; Park, J. C. ; Karur-Shanmugam, R.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1459-1468,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
4.

Conference Proceedings
Conference Proceedings
4. Combining OPC and design for printability into 65-nm logic designs
Lucas, K.D. ; Yuan, C.-M. ; Boone, R. ; Strozewski, K. ; Porter, J. ; Tian, R. ; Wimmer, K. ; Cobb, J. ; Wilkinson, B. ; Toublan, O.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.158-169,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
5.

Conference Proceedings
Conference Proceedings
5. OPC to account for thick mask effect using simplified boundary layer model [6349-133]
Kim, S. ; Kim, Y.-C. ; Suh, S. ; Lee, S. ; Cho, H. ; Moon, J. ; Cobb, J. ; Lee, S.
Pub. info.: Photomask Technology 2006.  pp.63493I-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
6.

Conference Proceedings
Conference Proceedings
6. High transmission mask technology for 45nm node imaging [6154-38]
Conley, W. ; Morgana, N. ; Kasprowicz, B. S. ; Cangemi, M. ; Lassiter, M. ; Litt, L. C. ; Cangemi, M. ; Cottle, R. ; Wu, W. ; Cobb, J. ; Ham, Y. -M. ; Lucas, K. ; Roman, B. ; Progler, C.
Pub. info.: Optical Microlithography XIX.  pp.615411-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
7.

Conference Proceedings
Conference Proceedings
7. Single-layer and bilayer resist processes for EUV-type integrations
Peters, R.D. ; Parker, C. ; Cobb, J. ; Luckowski, E. ; Weisbrod, E. ; Dauksher, B.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.746-756,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
8.

Conference Proceedings
Conference Proceedings
8. Evaluation of the critical dimension control requirements in the ITRS using statistical simulation and error budgets
Hector, S.D. ; Postnikov, S.V. ; Cobb, J.
Pub. info.: Optical Microlithography XVII.  pp.555-570,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
9.

Conference Proceedings
Conference Proceedings
9. Process latitude measurements and their implications for CD control in EUV lithography
Cobb, J. ; Peters, R. ; Postnikov, S. ; Hector, S.D. ; Lu, B. ; Weisbrod, E. ; Wasson, J.R. ; Mangat, P. ; O'Connell, D.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.43-52,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374