1.

Conference Proceedings
Conference Proceedings
1. Gel layer model for photoresist development
Cho,J.Y. ; Choi,S.J. ; Kim,B.U. ; Park,J.M. ; Lee,S.J.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part1  pp.432-441,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Dry etching characteristics of attenuated phase-shifting masks using Cl2/CF4/O2/He plasmas
Choi,S.J. ; Cha,H.-S. ; Yoon,S.-Y. ; Jung,S.-M. ; Choi,S.-S. ; Jeong,S.-H.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.561-570,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562