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17 results

Conference Proceedings

1. Evaluation of various alternating phase shifting mask processes for KrF lithography

Yoon,S.-Y. ; Cha,H.-S. ; Choi,S.-J. ; Jung,S.-M. ; Choi,S.-S. ; Jeong,S.-H.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.1017-1025, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

Conference Proceedings

2. Optimization of alternating phase shifting mask structure

Cha,H.-S. ; Choi,S.-J. ; Yoon,S.-Y. ; Jung,S.-M. ; Choi,S.-S. ; Jeong,S.-H.

Pub. info.:	21st Annual BACUS Symposium on Photomask Technology. 4562 pp.1008-1016, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4562

Conference Proceedings

3. Improved lithographic performance of 193-nm photoresists based on cycloolefin/maleic anhydride copolymer by employing mixed PAGs

Choi,S.-J. ; Choi,Y.-J. ; Kim,Y.-S. ; Kim,S.-D. ; Kim,D.-B. ; Kim,J.-H. ; Koh,C.-W. ; Lee,G. ; Jung,J.-C. ; Baik,K.-H.

Pub. info.:	Advances in resist technology and processing XVIII. 4345 pp.94-105, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

4. Improved lithographic performance for resists based on polymers having a vinyl ether-maleic anhydride (VEMA) backbone

Tanaka,T. ; Choi,S.-J. ; Jung,D.-W. ; Lee,S. ; Lee,S.-H. ; Kang,Y. ; Woo,S.-G. ; Moon,J.-T. ; Kavanagh,R.J. ; Barclay,G.G. ; Orsula,G.W. ; Mattia,J. ; Caporale,S. ; Adams,T.G. ; Tanaka,T. ; Kang,D.

Pub. info.:	Advances in resist technology and processing XVIII. 4345 pp.119-130, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

5. Novel single-layer chemically amplified resist for 193-nm lithography

Choi,S.-J. ; Kang,Y. ; Jung,D.-W. ; Park,C.-G. ; Moon,J.-T.

Pub. info.:	Advances in resist technology and processing XIV : 10-12 March 1997, Santa Clara, California. pp.104-112, 1997. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3049

Conference Proceedings

6. Design and synthesis of new photoresist materials for ArF lithography

Choi,S.-J. ; Kim,H.-W. ; Woo,S.-G. ; Moon,J.-T.

Pub. info.:	Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA. Part1 pp.54-61, 2000. Bellingham, Wash.. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3999

Conference Proceedings

7. Novel 193-nm photoresist based on Olefin-containing lactones

Yoon,K.-S. ; Jung,D.-W. ; Lee,S. ; Lee,S.-H. ; Choi,S.-J. ; Woo,S.-G. ; Moon,J.-T.

Pub. info.:	Advances in resist technology and processing XVIII. 4345 pp.688-694, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

Conference Proceedings

8. ArF lithography options for 100-nm technologies

Vandenberghe,G.N. ; Kim,Y.-C. ; Delvaux,C. ; Lucas,K.D. ; Choi,S.-J. ; Ercken,M. ; Ronse,K. ; Vleeming,B.

Pub. info.:	Optical Microlithography XIV. 4346 pp.179-190, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

9. Design and performance of photoresist materials for ArF lithography

Kim,H.-W. ; Jung,D.-W. ; Lee,S. ; Choi,S.-J. ; Woo,S.-G. ; Kavanagh,R.J. ; Barclay,G.G. ; Blacksmith,R.F. ; Kang,D. ; Pohlers,G. ; Cameron,J.F. ; Mattia,J. ; Caporale,S. ; Penniman,T. ; Joesten,L.A. ; Thackeray,J.W.

Pub. info.:	Advances in resist technology and processing XVIII. 4345 pp.776-783, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

10.

Conference Proceedings

10. Development of resists for thermal flow process applicable to mass production

Kang,Y. ; Woo,S.-G. ; Choi,S.-J. ; Moon,J.-T.

Pub. info.:	Advances in resist technology and processing XVIII. 4345 pp.222-231, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

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Author: Choi,S.-J.