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22 results

Conference Proceedings

1. A new method for correcting proximity and fogging effects by using the EID model of variable shaped beam for 65-nm node [5853-07]

Park, E.-S. ; Cho, H.-J. ; Kim, J.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.58-65, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

2. A study of storage life extension for high performance chemically amplified resist coated blanks [5853-03]

Yang, S.-J. ; Seo, S.-M. ; Ko, S.-H. ; Cha, H.-S. ; Kang, G.-W. ; Nam, K.-S. ; Seo. W.-W. ; Jung, W.-K. ; Cho, H.-K. ; Kim, J.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XII. pp.20-30, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5853

Conference Proceedings

3. Comparative evaluation of positive and negative chemically amplified resist characteristics for 90-nm-node photomask production

Jeong, W.-G. ; Park, D.-I. ; Park, E.-S. ; Seo, S.-K. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.157-167, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

4. The feasibility study of thin Cr film for low process bias

Seo, W.-W. ; Yoon, S.-Y. ; Park, D.-I. ; Park, E.-S. ; Kim, J.-M. ; Jeong, S.-M. ; Choi, S.-S. ; Cha, H.-S. ; Nam, K.S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.136-143, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

5. A study of post-exposure baking effect for CAR process in photomask fabrication

Park, D.-I. ; Seo, S.-K. ; Jeong, W.-G. ; Park, E.-S. ; Lee, J.-H. ; Kwon, H.-J. ; Kim, J.-M. ; Jung, S.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.190-196, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

Conference Proceedings

6. Accurate alignment technique for nanoimprint lithography

Kang, H.-B. ; Kim, J.-M. ; Kim, Y.-D. ; Cho, H.-J. ; Choi, S.-S.

Pub. info.:	Metrology, Inspection, and Process Control for Microlithography XIX. pp.429-437, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5752

Conference Proceedings

7. Characteristics of residues and optical change of HT PSM during stepwise west cleaning and optimization of HT PSM cleaning process

Jeong, W.-G. ; Kim, D.-W. ; Park, C.-M. ; An, K.-W. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.597-605, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

8. Comparative evaluation of mask cleaning performance

Jeong, W.-G. ; Park, D.- ; Park, E.-S. ; Cho, Y.-W. ; Choi, S.-J. ; Kwon, H.-J. ; Kim, J.-M. ; Choi, S.-S.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.510-517, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

9. Decrease of chrome residue on MoSiON in embedded attenuated-PSM processing

Kim, Y.-D. ; Kim, D.-W. ; Lee, D.-S. ; Jang, P.-J. ; Kwon, H.-J. ; Cho, H.-J. ; Kim, J.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.193-199, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

10.

Conference Proceedings

10. The judgment criteria of halftone pinhole defects

Shin, K.M. ; Kim, D.-W. ; Lee, J.-K. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology XI. pp.330-341, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5446

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Author: Choi, S.-S.