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12 results

Conference Proceedings

1. Quantitative description of phenolic polymer dissolution using the concept of gel layer: II. Base cation size effect

Cho, J.-Y. ; Choi, S.-J.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part Two pp.912-920, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

2. Photonic crystal lasers(Invited Paper)

O'Brien, J.D. ; Lee, P.-T. ; Cao, J.-R. ; Kuang, W. ; Kim, C. ; Kim, W.-J. ; Yang, T. ; Choi, S.-J. ; Dapkus, P.D.

Pub. info.:	VCSELs and Optical Interconnects. pp.194-206, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4942

Conference Proceedings

3. Comparative evaluation of mask cleaning performance

Jeong, W.-G. ; Park, D.- ; Park, E.-S. ; Cho, Y.-W. ; Choi, S.-J. ; Kwon, H.-J. ; Kim, J.-M. ; Choi, S.-S.

Pub. info.:	23rd Annual BACUS Symposium on Photomask Technology. pp.510-517, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5256

Conference Proceedings

4. Etching selectivity and surface profile of attenuated phase-shifting mask using CF4/O2/He inductively coupled plasma (ICP)

Yoon, S.-Y. ; Choi, S.-J. ; Kim, Y.-D. ; Lee, D.-H. ; Cha, H.-S. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.332-340, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

5. Highly anisotropic etching of phase-shift masks using ICP of CF4-SF6-CHF3 gas mixtures

Choi, S.-J. ; Cha, H.-S. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, D.-H. ; Kim, J.-M. ; Kim, J.-S. ; Min, D.-S. ; Jang, P.-J. ; Chang, B.-S. ; Kwon, H.-J. ; Choi, B.-Y. ; Choi, S.-S. ; Jeong, S.H.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology IX. pp.303-311, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4754

Conference Proceedings

6. Application of DoseMapper for 65-nm gate CD control: strategies and results [6349-16]

Jeewakhan, N. ; Shamma, N. ; Choi, S.-J. ; Alvarez, R. ; Son, D. H. ; Nakamura, M. ; Pici, V. ; Schreiber, J. ; Tzeng, W. ; Ang, S. ; Park, D.

Pub. info.:	Photomask Technology 2006. pp.63490G-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	6349

Conference Proceedings

7. Fluorocarbon-based single-layer resist for 157-nm lithography

Song, K.Y. ; Yoon, K.-S. ; Choi, S.-J. ; Woo, S.-G. ; Han, W.-S. ; Lee, J.-J. ; Lee, S.-K. ; Noh, C.-H. ; Honda, K.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.504-511, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

Conference Proceedings

8. Preserving EAPSM phase and transmission in the clean process

Choi, S.-J. ; Yoon, S.-Y. ; Kim, Y.-D. ; Lee, H.-W. ; Kim, D.-H. ; Lee, S.-W. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.713-724, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

9. Implementation of the ArF resists based on VEMA for sub-100-nm device

Kim, H.-W. ; Lee, S. ; Choi, S.-J. ; Lee, S.-H. ; Kang, Y. ; Woo, S.-G. ; Nam, D.S. ; Chae, Y.-S. ; Kim, J.S. ; Moon, J.-T. ; Kavanagh, R.J. ; Barclay, G.G.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.533-540, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

10.

Conference Proceedings

10. Macrocycle monomer having ethyleneoxy unit to buffer acid diffusion (new base for photoresist)

Lee, G. ; Kong, K.-K. ; Jung, J.-C. ; Shin, K.-S. ; Kang, J.-H. ; Kim, S.D. ; Choi, Y.-J. ; Choi, S.-J. ; Kim, D.-B. ; Kim, J.-H.

Pub. info.:	Advances in Resist Technology and Processing XIX. Part One pp.136-140, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4690

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Author: Choi, S.-J.