1.
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Conference Proceedings
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Hsieh, H.-C. ; Hung, J.C. ; Chin, A.S.J. ; Lee, S.C. ; Shin, J.J. ; Liu, R.G. ; Lin, B.J.
Pub. info.: |
Photomask and Next-Generation Lithography Mask Technology X. pp.4-15, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering |
Title of ser.: |
Proceedings of SPIE - the International Society for Optical Engineering |
Ser. no.: |
5130 |
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2.
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Conference Proceedings
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Wang, W.-C. ; Chang, S.-M. ; Chin, C.C. ; Lu, C.-L. ; Chin, A.S.J. ; Hsieh, H.-C. ; Yu, S.-S.
Pub. info.: |
23rd Annual BACUS Symposium on Photomask Technology. pp.266-275, 2003. Bellingham, Wash.. SPIE - The International Society of Optical Engineering |
Title of ser.: |
Proceedings of SPIE - the International Society for Optical Engineering |
Ser. no.: |
5256 |
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