1.

Conference Proceedings
Conference Proceedings
1. Novel device structure for low-temperature polysilicon TFTs with controlled grain growth in channel regions
Cheng,L.-J. ; Lu,Y.-L. ; Lin,C.-W. ; Chang,T.-K. ; Cheng,H.-C.
Pub. info.: Display technologies III : 26-27 July 2000, Taipei, Taiwan.  pp.51-54,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4079
2.

Conference Proceedings
Conference Proceedings
2. Effect of effective intrinsic a-Si: H thickness for backchannel-etch-type a-Si TFTs
Tsai,J.-W. ; Luo,F.-C. ; Cheng,H.-C.
Pub. info.: Display technologies II : 9-11 July 1998, Taipei, Taiwan.  pp.159-162,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3421
3.

Conference Proceedings
Conference Proceedings
3. Field emission characteristics of carbon nanotube emitters using screen-printing technique
Lee,C.-C. ; Chuang,F.-Y. ; Lin,J.-D. ; Liao,J.-H. ; Cheng,H.-C. ; Sheu,J.-R. ; Chang,Y.-Y. ; Tsou,C.-C. ; Wang,W.-C.
Pub. info.: Display technologies III : 26-27 July 2000, Taipei, Taiwan.  pp.101-109,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4079
4.

Conference Proceedings
Conference Proceedings
4. Field emission display using carbon nanotubes as emitters
Chuang,F.-Y. ; Lee,C.-C. ; Lin,J.-D. ; Liao,J.-H. ; Cheng,H.-C. ; Han,C.-X. ; Kwo,J.-L ; Wang,W.-C.
Pub. info.: Display technologies III : 26-27 July 2000, Taipei, Taiwan.  pp.94-100,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4079
5.

Conference Proceedings
Conference Proceedings
5. Process development and impurities analysis for the bottom antireflective coating material
Ko,F.-H. ; Chen,H.-L. ; Huang,T.-Y. ; Cheng,H.-C. ; Ko,C.-J. ; Chu,T.-C.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XV.  pp.562-571,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4344
6.

Conference Proceedings
Conference Proceedings
6. Fabrication and characterization of gated Si field emitter arrays with gate aperture below 0.5 ｦﾌm
Ku,T.-K. ; Hsieh,B.B. ; Chen,M.S. ; Wang,C.-C. ; Wang,P.W. ; Hsieh,I.-J. ; Cheng,H.-C.
Pub. info.: Microelectronic Structures and Microelectromechanical Devices for Optical Processing and Multimedia Applications.  pp.140-144,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2641
7.

Conference Proceedings
Conference Proceedings
7. Fabrication and characterization of the Pd-silicided emitters for field-emission devices
Wang,C.-C. ; Ku,T.-K. ; Feng,M.-S. ; Hsieh,I.-J. ; Cheng,H.-C.
Pub. info.: Microelectronic Structures and Microelectromechanical Devices for Optical Processing and Multimedia Applications.  pp.145-152,  1995.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2641