1.

Conference Proceedings
Conference Proceedings
1. Electrical Characterization of HfO xN y Gate Dielectric with Different Nitrogen Concentration Profiles Formed by Rapid Thermal Annealing
Cheng, C.-L. ; Chang-Liao, K.-S. ; Wang, T.-K.
Pub. info.: Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium.  pp.286-291,  2004.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2004-01
2.

Conference Proceedings
Conference Proceedings
2. Chemical dry cleaning and pretreatment on the electrical and reliability characteristic of high-k gate dielectrics in MOS device (Invited Paper)
Cheng, C.-L. ; Wang, T.-K. ; Chang-Liao, K.-S.
Pub. info.: Quantum Sensing: Evolution and Revolution from Past to Future.  pp.299-306,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4999