1.

Conference Proceedings
Conference Proceedings
1. Antireflection strategies for sub-0.18-ｦﾌm dual-damascene structure patterning in KrF 248-nm lithography
Chou,S.-Y. ; Wang,C.-M. ; Hsia,C.-C. ; Chen,L.-J. ; Hwang,G.-W. ; Lee,S.-D. ; Lou,J.-C.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part2  pp.923-931,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Customized off-axis illumination aperture filtering for sub-0.18-ｦﾌm KrF Lithography
Hsia,C.-C. ; Gau,T.-S. ; Yang,C.-H. ; Liu,R.-C. ; Chang,C.-H. ; Chen,L.-J. ; Wang,C.-M. ; Chen,J.F. ; Smith,B.W. ; Hwang,G.-W. ; Lay,J.-W. ; Goang,D.-Y.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.427-434,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. High-transmission PSM inspection sensitivity
Wu,C.-H. ; Wang,D. ; Wang,C.-M. ; Chen,L.-J. ; Chou,S.-Y. ; Wu,C. ; Schumann,N. ; Falah,R. ; Staud,W.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part1  pp.117-126,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
4.

Conference Proceedings
Conference Proceedings
4. Mix-and-match lithography processes for 0.1-ｦﾌm MOS transistor device fabrication
Yew,J.-Y. ; Chen,L.-J. ; Nakamura,K. ; Chao,T.-S. ; Lin,H.-C.
Pub. info.: Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California.  pp.180-188,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2723
5.

Conference Proceedings
Conference Proceedings
5. Evaluating the impact of spherical aberration on sub-0.2-μm contact/via hole patterning
Chou,S.-Y. ; Lou,J.-C. ; Lai,C.-M. ; Liang,F.-J. ; Chen,L.-J.
Pub. info.: Optical Microlithography XIV.  4346  pp.1318-1327,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
6.

Conference Proceedings
Conference Proceedings
6. Lithography challenges of dual-damascence process in 0.13-μm era
Chen,L.-J. ; Shiu,L.-H. ; Tsai,C.-S. ; Chang,C.-H. ; Kang,T.-K. ; Chou,S.-Y.
Pub. info.: Optical Microlithography XIV.  4346  pp.907-916,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
7.

Conference Proceedings
Conference Proceedings
7. Novel negative photoresist process for 0.18-μm dual damascene
Shiu,L.-H. ; Lai,C.-M. ; Liang,F.-J. ; Chen,H.-C. ; Chen,L.-J. ; Chou,S.-Y.
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.592-600,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345