1.

Conference Proceedings
Conference Proceedings
1. Burst assembly and scheduling mechanism for optical burst switching networks
Wu, G.L. ; Li, X.W. ; Chen, J.F. ; Chen, J.P.
Pub. info.: APOC 2002: Asia-Pacific Optical and Wireless Communications : optical networking II : 16-18 October 2002, Shanghai, China.  pp.318-323,  2002.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4910
2.

Conference Proceedings
Conference Proceedings
2. Extending aggressive low-k1 design rule requirements for 90-nm and 65-nm nodes via simultaneous optimization of NA, illumination, and OPC
Roy, S. ; Van Den Broeke, D.J. ; Chen, J.F. ; Liebchen, A. ; Chen, T. ; Hsu, S.D. ; Shi, X. ; Socha, R.J.
Pub. info.: Design and process integration for microelectronic manufacturing II [sic] : 26-27 February 2004, Santa Clara, California, USA.  pp.190-201,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5379
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Conference Proceedings
Conference Proceedings
3. Crossing the divide between lithography and chip design(Invited Paper)
Arnold, W.H. ; Chen, J.F. ; Wampler, K.E.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.243-253,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
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Conference Proceedings
Conference Proceedings
4. Development of a sub-100nm integrated imaging system using chromeless phase-shifting imaging with very high NA KrF exposure and off-axis illumination
Petersen, J.S. ; Conley, W. ; Roman, B.J. ; Litt, L.C. ; Lucas, K. ; Wu, W. ; Van Den Broeke, D.J. ; Chen, J.F. ; Laidig, T.L. ; Wampler, K.E. ; Gerold, D.J. ; Maslow, M.J. ; Socha, R.J. ; van Praagh, J. ; Droste, R.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.298-311,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
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Conference Proceedings
Conference Proceedings
5. Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node
Van Den Broeke, D.J. ; Laidig, T.L. ; Chen, J.F. ; Wampler, K.E. ; Hsu, S.D. ; Shi, X. ; Socha, R.J. ; Dusa, M.V. ; Corcoran, N.P.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.550-559,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
6.

Conference Proceedings
Conference Proceedings
6. CPL reticle technology for advanced device applications
Conley, W.E. ; Van Den Broeke, D.J. ; Socha, R.J. ; Wu, W. ; Litt, L.C. ; Lucas, K.D. ; Roman, B.J. ; Peters, R.D. ; Parker, C. ; Chen, J.F. ; Wampler, K.E. ; Laidig, T.L. ; Schaefer, E. ; Kuijten, J.-P. ; Verhappen, A. ; van de Goor, S. ; Chaplin, M. ; Kasprowicz, B.S. ; Progler, C.J. ; Robert, E. ; Thony, P. ; Hathorn, M.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.578-584,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
7.

Conference Proceedings
Conference Proceedings
7. CPL mask technology for sub-100-nm contact hole imaging
Kasprowicz, B.S. ; Conley, W.E. ; Litt, L.C. ; Van Den Broeke, D.J. ; Montgomery, P.K. ; Socha, R.J. ; Wu, W. ; Lucas, K.D. ; Roman, B.J. ; Chen, J.F. ; Wampler, K.E. ; Laidig, T.L. ; Progler, C.J. ; Hathorn, M.E.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.624-631,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
8.

Conference Proceedings
Conference Proceedings
8. Through-pitch low-k1 contact hole imaging with CPL technology
Wiaux, V. ; Bekaert, J. ; Chen, J.F. ; Hsu, S.D. ; Ronse, K.G. ; Socha, R.J. ; Vandenberghe, G. ; Van Den Broeke, D.J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.585-594,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
9.

Conference Proceedings
Conference Proceedings
9. Patterning half-wavelength DRAM cell using chromeless phase lithography (CPL)
Hsu, C. ; Chu, R. ; Chen, J.F. ; Van Den Broeke, D.J. ; Shi, X. ; Hsu, S.D. ; Wang, T.
Pub. info.: Optical Microlithography XV.  Part One  pp.76-88,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
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Conference Proceedings
Conference Proceedings
10. Investigation of model OPC optimization based on CD uniformity yield
Roy, S. ; Chen, J.F. ; Liebchen, A. ; Laidig, T.L. ; Wampler, K.E. ; Hollerbach, U.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.810-816,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038